Influence of the content of stacked ZnO on the structural and optical properties of heterostructured ZnO/Ga2O3 films

Q2 Engineering
Peverga R. Jubu , E. Danladi , M.B. Ochang , O. Adedokun , C.C. Amadi , D.D. Hile , W.V. Zhiya , A.A. Iorokpen , Y. Yusof , F.K. Yam
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Abstract

The rising demand for heterojunction materials stimulated by the great achievements of modern nanotechnology has triggered enormous interests in the investigation of their materials properties. Heterostructured ZnO/Ga2O3 has been deployed for different device applications, but its several optical parameters have rarely been investigated. The present work attempts to investigate the influence of the thickness of stacked ZnO layer on the surface of Ga2O3 film. Optical parameters, such as absorption and extinction coefficient, Urbach energy, refractive index, dielectric constants, optical dispersion energy, single oscillator energy, static refractive index, oscillator strength, and oscillator wavelength of the ZnO/Ga2O3 films were studied. Morphological characterization showed microstructures of various shapes. Cross-section measurements showed that the thickness of the Ga2O3 layer remained approximately the same for all samples, while the thickness of the ZnO layer increased from 0 to 5.14 nm. Structural analysis revealed the coexistence of β-Ga2O3 and wurtzite ZnO crystal phases. UV–Vis absorption spectra demonstrated two distinct absorptions belonging to the β-Ga2O3 and ZnO. The bandgap of the composite ranged between 4.43 and 4.69 eV with an increase in the amount of ZnO at the surface. The absorption and extinction coefficient were in the order of 103 cm−1 and 10−5, respectively. The Urbach energy ranged between 0.688 and 1.125 eV. The refractive index was in the range 2.09–2.85, while the static refractive index ranged between 1.90 and 2.73. Also reported were other optical parameters, such as the real and imaginary dielectric constant, dispersive energy, single oscillator energy, oscillator strength, and oscillator wavelength.

叠层氧化锌含量对异质结构 ZnO/Ga2O3 薄膜结构和光学特性的影响
现代纳米技术的巨大成就刺激了对异质结材料日益增长的需求,从而引发了对其材料特性研究的巨大兴趣。异质结构 ZnO/Ga2O3 已被用于不同的器件应用中,但其几个光学参数却很少被研究。本研究试图探讨叠层 ZnO 层的厚度对 Ga2O3 薄膜表面的影响。研究了 ZnO/Ga2O3 薄膜的吸收和消光系数、厄巴赫能、折射率、介电常数、光色散能、单振子能、静态折射率、振子强度和振子波长等光学参数。形态表征显示了各种形状的微结构。横截面测量显示,所有样品中 Ga2O3 层的厚度基本保持不变,而 ZnO 层的厚度则从 0 纳米增加到 5.14 纳米。结构分析表明,β-Ga2O3 和钨锌晶相共存。紫外可见吸收光谱显示,β-Ga2O3 和氧化锌具有两种不同的吸收。随着表面氧化锌含量的增加,复合材料的带隙介于 4.43 和 4.69 eV 之间。吸收系数和消光系数分别为 103 cm-1 和 10-5 的数量级。乌巴赫能介于 0.688 和 1.125 eV 之间。折射率在 2.09-2.85 之间,而静态折射率在 1.90-2.73 之间。此外,还报告了其他光学参数,例如实介电常数和虚介电常数、色散能量、单振子能量、振子强度和振子波长。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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来源期刊
Optical Materials: X
Optical Materials: X Engineering-Electrical and Electronic Engineering
CiteScore
3.30
自引率
0.00%
发文量
73
审稿时长
91 days
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