Formation of ZnWO4/WO3 composite film by RF magnetron sputtering and calcination

Sho Kakuta, Takeru Okada
{"title":"Formation of ZnWO4/WO3 composite film by RF magnetron sputtering and calcination","authors":"Sho Kakuta, Takeru Okada","doi":"10.1116/6.0003180","DOIUrl":null,"url":null,"abstract":"This study demonstrates the formation of ZnWO4/WO3 composite that are engendered by cosputtering deposition followed by calcination. The concentrations of the tungsten dopant are found to have a profound effect on crystal formation, composition, and photoluminescence. The quantum efficiency measurements investigating different excitation light directions indicate that WO3 can form an underlayer of ZnWO4 at high dopant concentrations. The formation of bilayerlike films is caused by segregation, resulting from time evolution of sputtering yield due to temperature changes at the surface of the sputtering target.","PeriodicalId":509398,"journal":{"name":"Journal of Vacuum Science & Technology A","volume":null,"pages":null},"PeriodicalIF":0.0000,"publicationDate":"2024-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Journal of Vacuum Science & Technology A","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1116/6.0003180","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0

Abstract

This study demonstrates the formation of ZnWO4/WO3 composite that are engendered by cosputtering deposition followed by calcination. The concentrations of the tungsten dopant are found to have a profound effect on crystal formation, composition, and photoluminescence. The quantum efficiency measurements investigating different excitation light directions indicate that WO3 can form an underlayer of ZnWO4 at high dopant concentrations. The formation of bilayerlike films is caused by segregation, resulting from time evolution of sputtering yield due to temperature changes at the surface of the sputtering target.
通过射频磁控溅射和煅烧形成 ZnWO4/WO3 复合薄膜
本研究展示了通过共溅沉积和煅烧形成的 ZnWO4/WO3 复合材料。研究发现,掺杂钨的浓度对晶体的形成、组成和光致发光有深远影响。对不同激发光方向的量子效率测量表明,在高掺杂浓度下,WO3 可以形成 ZnWO4 的底层。双层膜的形成是由偏析引起的,而偏析是由于溅射靶表面温度变化引起的溅射产率的时间演化造成的。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
求助全文
约1分钟内获得全文 求助全文
来源期刊
自引率
0.00%
发文量
0
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
确定
请完成安全验证×
copy
已复制链接
快去分享给好友吧!
我知道了
右上角分享
点击右上角分享
0
联系我们:info@booksci.cn Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术官方微信