Journal of Vacuum Science & Technology A

Nitrogen-incorporated tetrahedral amorphous carbon optically transparent thin film electrode

Pub Date : 2024-07-26 DOI: 10.1116/6.0003786 Nina Baule, L. Haubold, T. Schuelke

Impact of sputtering and redeposition on the morphological profile evolution during ion-beam etching of blazed gratings

Pub Date : 2024-07-26 DOI: 10.1116/6.0003745 Ze-Xuan Liu, Xing-Yu Li, Quanzhi Zhang, J. Schulze, Ruobing Zhang, You-Nian Wang

Effect of plasma discharge pulse length for GaN film crystallinity on sapphire substrate by high density convergent plasma sputtering device

Pub Date : 2024-07-25 DOI: 10.1116/6.0003743 Itsuki Misono, T. Motomura, T. Tabaru, Masato Uehara, Tetsuya Okuyama