Laser-Based Copper Deposition for Semiconductor Debug Applications

Michael DiBattista, Scott Silverman, Matthew M. Mulholland
{"title":"Laser-Based Copper Deposition for Semiconductor Debug Applications","authors":"Michael DiBattista, Scott Silverman, Matthew M. Mulholland","doi":"10.31399/asm.edfa.2023-4.p012","DOIUrl":null,"url":null,"abstract":"Laser-assisted copper deposition provides a key technology for analyzing complex packaging and integrated circuit challenges. Laser-based copper deposition techniques have been shown to be useful in combination with traditional FIB techniques to improve resistivity, deposition rate, and timing.","PeriodicalId":431761,"journal":{"name":"EDFA Technical Articles","volume":null,"pages":null},"PeriodicalIF":0.0000,"publicationDate":"2023-11-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"EDFA Technical Articles","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.31399/asm.edfa.2023-4.p012","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
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Abstract

Laser-assisted copper deposition provides a key technology for analyzing complex packaging and integrated circuit challenges. Laser-based copper deposition techniques have been shown to be useful in combination with traditional FIB techniques to improve resistivity, deposition rate, and timing.
用于半导体调试应用的激光沉铜技术
激光辅助铜沉积技术是分析复杂封装和集成电路难题的关键技术。事实证明,激光铜沉积技术与传统的 FIB 技术相结合,可有效提高电阻率、沉积率和时序。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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