{"title":"Investigating The Effect of Various Parameters on The Yield of Graphene Obtained Through Graphite Exfoliation Using CO2 Supercritical Fluid","authors":"S. Saeedi, Javad Sargolzaei","doi":"10.30684/etj.2023.143211.1569","DOIUrl":null,"url":null,"abstract":"characterized by TEM, RAMAN, XRD, and AFM techniques. Based on the obtained results, it was found that mono/bilayer graphene was obtained by applying optimum conditions. The results confirmed the formation of mono/bilayer graphene based on the G-Band of 1583 cm -1 in the Raman test, a wavelength of 26.44° in the XRD test, and a thickness of 1.5 nm in the AFM test. With a simple, low-cost approach, this method, without using toxic and expensive chemicals with high profitability, can replace other complex graphene production methods, such as chemical vapor leakage and plasma etching, and be chemically reduced. .","PeriodicalId":507832,"journal":{"name":"Engineering and Technology Journal","volume":"118 1","pages":""},"PeriodicalIF":0.0000,"publicationDate":"2023-12-31","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Engineering and Technology Journal","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.30684/etj.2023.143211.1569","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0
Abstract
characterized by TEM, RAMAN, XRD, and AFM techniques. Based on the obtained results, it was found that mono/bilayer graphene was obtained by applying optimum conditions. The results confirmed the formation of mono/bilayer graphene based on the G-Band of 1583 cm -1 in the Raman test, a wavelength of 26.44° in the XRD test, and a thickness of 1.5 nm in the AFM test. With a simple, low-cost approach, this method, without using toxic and expensive chemicals with high profitability, can replace other complex graphene production methods, such as chemical vapor leakage and plasma etching, and be chemically reduced. .