{"title":"Spatiotemporal evolution and its impact on the deposition behavior of atmospheric TEOS/O2/Ar plasma: A numerical study","authors":"Jiaxin Chang, Dong Dai, Cheng Zhang, Tao Shao","doi":"10.1002/ppap.202300172","DOIUrl":null,"url":null,"abstract":"Atmospheric dielectric barrier discharge (DBD) is a promising approach for large-area deposition, whose spatiotemporal evolution determines the deposition rate and film chemistry. To investigate the relationship between the discharge and deposition behavior of tetraethoxysilane/oxygen/argon (TEOS/<math altimg=\"urn:x-wiley:16128850:media:ppap202300172:ppap202300172-math-0001\" location=\"graphic/ppap202300172-math-0001.png\">\n<semantics>\n<mrow>\n<msub>\n<mi mathvariant=\"normal\">O</mi>\n<mn>2</mn>\n</msub>\n</mrow>\n${\\text{O}}_{2}$</annotation>\n</semantics></math>/Ar) DBD, a one-dimensional (1D) fluid model was constructed and experimentally verified. The calculation results reveal that TEOS mainly affects the discharge behavior via Penning ionization, while <math altimg=\"urn:x-wiley:16128850:media:ppap202300172:ppap202300172-math-0002\" location=\"graphic/ppap202300172-math-0002.png\">\n<semantics>\n<mrow>\n<msub>\n<mi mathvariant=\"normal\">O</mi>\n<mn>2</mn>\n</msub>\n</mrow>\n${\\text{O}}_{2}$</annotation>\n</semantics></math> mainly affects discharge via attachment reaction. Penning ionization reduces the excited Ar and the attachment reaction reduces the number of discharges in half voltage cycles. As a result, merely increasing the concentration of TEOS or <math altimg=\"urn:x-wiley:16128850:media:ppap202300172:ppap202300172-math-0003\" location=\"graphic/ppap202300172-math-0003.png\">\n<semantics>\n<mrow>\n<msub>\n<mi mathvariant=\"normal\">O</mi>\n<mn>2</mn>\n</msub>\n</mrow>\n${\\text{O}}_{2}$</annotation>\n</semantics></math> may not proportionally increase the deposition rate of relevant reactive species.","PeriodicalId":20135,"journal":{"name":"Plasma Processes and Polymers","volume":null,"pages":null},"PeriodicalIF":2.9000,"publicationDate":"2023-12-26","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Plasma Processes and Polymers","FirstCategoryId":"101","ListUrlMain":"https://doi.org/10.1002/ppap.202300172","RegionNum":3,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q2","JCRName":"PHYSICS, APPLIED","Score":null,"Total":0}
引用次数: 0
Abstract
Atmospheric dielectric barrier discharge (DBD) is a promising approach for large-area deposition, whose spatiotemporal evolution determines the deposition rate and film chemistry. To investigate the relationship between the discharge and deposition behavior of tetraethoxysilane/oxygen/argon (TEOS//Ar) DBD, a one-dimensional (1D) fluid model was constructed and experimentally verified. The calculation results reveal that TEOS mainly affects the discharge behavior via Penning ionization, while mainly affects discharge via attachment reaction. Penning ionization reduces the excited Ar and the attachment reaction reduces the number of discharges in half voltage cycles. As a result, merely increasing the concentration of TEOS or may not proportionally increase the deposition rate of relevant reactive species.
期刊介绍:
Plasma Processes & Polymers focuses on the interdisciplinary field of low temperature plasma science, covering both experimental and theoretical aspects of fundamental and applied research in materials science, physics, chemistry and engineering in the area of plasma sources and plasma-based treatments.