Kazuki Komiya, Koki Nagata, Hidehiko Yamaoka, Shuichi Date, Yuito Miyashita, Min Yan
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引用次数: 0
Abstract
Advances in microfabrication technology have enabled electron beam lithography (EB lithography) systems to produce microfabrication on the order of 10 of nanometers. Using this technology, we have fabricated nanogap electrodes that can generate large electric fields at low voltages. The gap between the tips of the fabricated electrodes is 100 nm, and the curvature of each tip is 50 nm. The device was confirmed to work as an electronic vacuum gauge, the device successfully measured vacuum from 10−3 to 1 Pa at the electrode voltage of 3 V.
期刊介绍:
Electronics and Communications in Japan (ECJ) publishes papers translated from the Transactions of the Institute of Electrical Engineers of Japan 12 times per year as an official journal of the Institute of Electrical Engineers of Japan (IEEJ). ECJ aims to provide world-class researches in highly diverse and sophisticated areas of Electrical and Electronic Engineering as well as in related disciplines with emphasis on electronic circuits, controls and communications. ECJ focuses on the following fields:
- Electronic theory and circuits,
- Control theory,
- Communications,
- Cryptography,
- Biomedical fields,
- Surveillance,
- Robotics,
- Sensors and actuators,
- Micromachines,
- Image analysis and signal analysis,
- New materials.
For works related to the science, technology, and applications of electric power, please refer to the sister journal Electrical Engineering in Japan (EEJ).