Relationship between poly(4-hydroxystyrene) (PHS) and tetramethylammonium hydroxide (TMAH) concentrations during the development of PHS films in TMAH aqueous solution studied by quartz crystal microbalance (QCM) method

IF 1.5 4区物理与天体物理 Q3 PHYSICS, APPLIED

Japanese Journal of Applied Physics Pub Date : 2023-12-21 DOI:10.35848/1347-4065/ad17dd

Yuko Tsutsui Ito, Kyoko Watanabe, Yuqing Jin, Takahiro Kozawa, Kazuo Sakamoto, Makoto Muramatsu

引用次数: 0

Abstract

The development (the dissolution of resist films in developer) is an important process of lithography. However, the details of the dissolution of resist polymers remain unclarified. In this study, the viscosity of 2.38 wt% tetramethylammonium hydroxide (TMAH) aqueous solution with poly(4-hydroxystyrene) (PHS) was investigated by a quartz crystal microbalance method. The relationship between PHS concentration and the viscosity of 2.38 wt% TMAH aqueous solution with PHS was measured. The kinetics (temporal change) of viscosity and PHS concentration during development was clarified. The maximum PHS concentration reachable during development approximately corresponded to the TMAH concentration independently of the film thickness.

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石英晶体微天平 (QCM) 法研究聚（4-羟基苯乙烯）（PHS）和四甲基氢氧化铵（TMAH）在 TMAH 水溶液中形成 PHS 薄膜过程中的浓度关系

显影（光刻胶薄膜在显影液中的溶解）是光刻技术的一个重要过程。然而，光刻胶聚合物溶解的细节仍未澄清。本研究采用石英晶体微天平法研究了含有聚（4-羟基苯乙烯）（PHS）的 2.38 wt% 四甲基氢氧化铵（TMAH）水溶液的粘度。测量了 PHS 浓度与含有 PHS 的 2.38 wt% TMAH 水溶液粘度之间的关系。明确了粘度和 PHS 浓度在发展过程中的动力学（时间变化）。显影过程中可达到的最大 PHS 浓度大致与 TMAH 浓度一致，与薄膜厚度无关。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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来源期刊

Japanese Journal of Applied Physics 物理-物理：应用

CiteScore

3.00

自引率

26.70%

发文量

818

审稿时长

3.5 months

期刊介绍： The Japanese Journal of Applied Physics (JJAP) is an international journal for the advancement and dissemination of knowledge in all fields of applied physics. JJAP is a sister journal of the Applied Physics Express (APEX) and is published by IOP Publishing Ltd on behalf of the Japan Society of Applied Physics (JSAP). JJAP publishes articles that significantly contribute to the advancements in the applications of physical principles as well as in the understanding of physics in view of particular applications in mind. Subjects covered by JJAP include the following fields: • Semiconductors, dielectrics, and organic materials • Photonics, quantum electronics, optics, and spectroscopy • Spintronics, superconductivity, and strongly correlated materials • Device physics including quantum information processing • Physics-based circuits and systems • Nanoscale science and technology • Crystal growth, surfaces, interfaces, thin films, and bulk materials • Plasmas, applied atomic and molecular physics, and applied nuclear physics • Device processing, fabrication and measurement technologies, and instrumentation • Cross-disciplinary areas such as bioelectronics/photonics, biosensing, environmental/energy technologies, and MEMS