Compositional engineering of magnetic anisotropy in Cr2SixGe2-xTe6

Ti Xie , Shanchuan Liang , Samuel Deitemyer , Qinqin Wang , Tong Zhou , Igor Žutić , Xixiang Zhang , Dongsheng Yuan , Xiang Zhang , Cheng Gong
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Abstract

Magnetic van der Waals (vdW) materials are highly sensitive to their chemical compositions and atomic structures, which presents rich opportunities for synthetic control of vdW ferromagnets. Here, we synthesized the quaternary alloys Cr2SixGe2-xTe6 using the flux method and discovered that the Ge:Si source ratio should be designed deliberately higher than the expected in resultant crystals due to the stronger affinity of Si than Ge to be involved in Cr2SixGe2-xTe6 reactions. Temperature-dependent magnetization and magnetic hysteresis measurements revealed that as the Si content increases, the Curie temperature decreases while the out-of-plane anisotropy increases monotonically. When x increases from 0 to 2 in Cr2SixGe2-xTe6, the out-of-plane saturation fields remain approximately unchanged at ∼0.2 T, while the in-plane saturation fields increase monotonically from 0.5 T to 1.2 T. The distinct behaviors between out-of-plane and in-plane saturation fields arise from the different mechanisms underpinning the two fields – the out-of-plane saturation field is determined by the competition of exchange interaction, magnetic anisotropy, and dipolar interaction, whereas the in-plane saturation field by magnetic anisotropy. Our compositional engineering provides a fundamental understanding of the layered magnetic materials and insightful guidance for the future design of vdW magnets.

Abstract Image

Cr2SixGe2-xTe6 中磁性各向异性的成分工程学
范德华(vdW)磁性材料对其化学成分和原子结构高度敏感,这为范德华铁磁体的合成控制提供了丰富的机会。在此,我们利用磁通量法合成了四元合金 Cr2SixGe2-xTe6,并发现由于 Si 比 Ge 在 Cr2SixGe2-xTe6 反应中具有更强的亲和力,因此应有意识地将 Ge:Si 源比率设计得比预期晶体更高。随温度变化的磁化和磁滞测量显示,随着硅含量的增加,居里温度降低,而面外各向异性单调增加。当 Cr2SixGe2-xTe6 中的 x 从 0 增加到 2 时,面外饱和磁场在 ∼0.2 T 时大致保持不变,而面内饱和磁场则从 0.5 T 单调增加到 1.2 T。面外饱和场与面内饱和场的不同表现源于两种场的不同作用机制--面外饱和场由交换相互作用、磁各向异性和偶极相互作用的竞争决定,而面内饱和场则由磁各向异性决定。我们的成分工程学提供了对层状磁性材料的基本认识,并为 vdW 磁体的未来设计提供了深刻的指导。
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