Calculation of Precision Measure and Effect of the Sample Crystallographic Orientation on the Charge Kinetics of MgO Single Crystals Subjected to keV Electron Irradiation

IF 1 4区工程技术 Q4 INSTRUMENTS & INSTRUMENTATION

MAPAN Pub Date : 2023-12-17 DOI:10.1007/s12647-023-00713-2

Aicha Boughariou, Osama Qays Abdullah, Guy Blaise

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Abstract

This study is performed with a dedicated scanning electron microscope (SEM) which allows the injection of few electrons doses in a large domain of energies and the measures of the secondary electron emission and the induced current created in the sample holder by the charges generated in the sample. In this paper, we present a detailed calcul of the precision measure on the intrinsic Secondary Electron Emission yield σ₀ and the stationary electron emission σ_st of magnesium oxide (MgO) single crystals of different crystalline orientation (100), (110) and (111)_. We notice that the precision measure becomes more and more excellent with increasing n (n is the number of equal time intervals Δt in which the measure of the induced and secondary currents is carried). The results shown that the crystalline orientation has a significant influence on intrinsic secondary electron emission σ₀ at low energies below 7 keV, but for high energies, the loss function of energy extending more deeply, the secondaries are dispersed before their release.

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精确测量的计算以及样品晶体取向对接受 keV 电子辐照的氧化镁单晶的电荷动力学的影响

摘要这项研究是利用专用扫描电子显微镜（SEM）进行的，该显微镜可在较大的能量范围内注入少量电子剂量，并测量二次电子发射和样品中产生的电荷在样品支架上产生的感应电流。本文详细计算了不同晶向（100）、（110）和（111）的氧化镁（MgO）单晶的本征二次电子发射率σ0和静态电子发射率σst。我们注意到，随着 n 的增加（n 是测量感应电流和次级电流的相等时间间隔 Δt 的个数），测量精度越来越高。结果表明，在 7 keV 以下的低能量下，晶体取向对本征二次电子发射 σ0 有显著影响，但在高能量下，能量损耗函数延伸得更深，二次电子在释放之前就已分散。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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来源期刊

MAPAN 工程技术-物理：应用

CiteScore

2.30

自引率

20.00%

发文量

审稿时长

3 months

期刊介绍： MAPAN-Journal Metrology Society of India is a quarterly publication. It is exclusively devoted to Metrology (Scientific, Industrial or Legal). It has been fulfilling an important need of Metrologists and particularly of quality practitioners by publishing exclusive articles on scientific, industrial and legal metrology. The journal publishes research communication or technical articles of current interest in measurement science; original work, tutorial or survey papers in any metrology related area; reviews and analytical studies in metrology; case studies on reliability, uncertainty in measurements; and reports and results of intercomparison and proficiency testing.