Simulation study of three-dimensional grayscale ice lithography on amorphous solid water for blazed gratings

IF 2.6 4区 工程技术 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC
Jinyu Guo , Shuoqiu Tian , Wentao Yuan , Xujie Tong , Rui Zheng , Shan Wu , Ding Zhao , Yifang Chen , Min Qiu
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Abstract

Electron beam lithography (EBL) on amorphous solid water (ASW), termed as ice lithography (IL), has demonstrated promising capability in pattern transfer with unique advantages such as reduced proximity effect. So far, ice lithography for binary patterning has been proved a great success, however, application for three-dimensional (3D) profiling in nanoscale has still not been addressed to the best of our knowledge. This paper reports, for the first time, our progress in simulating study of three-dimensional ice lithography on ASW for linear blazed gratings, aiming to overcome the difficulty in replicating high quality blazed gratings with high diffraction efficiency. Systematic simulation of grayscale ice lithography for 3-D blazed grating templates with desired surface quality as the task was carried out, using Monte Carlo algorithm based on the measured contrast curves of ASW. For comparison, grayscale electron beam lithography on PMMA was also performed. The resultant profiles of blazed wavelengths around 1550 nm by grayscale IL show less flaws and higher diffraction efficiencies than by EBL. The successful simulation of 3D grayscale IL provides us with instructive guide for the fabrication of 3D nanostructures as a whole through the grayscale ice lithography on ASW.

Abstract Image

Abstract Image

非晶固体水上三维灰度冰光刻技术用于炽热光栅的模拟研究
无定形固体水(ASW)上的电子束光刻(EBL)被称为冰光刻(IL),它具有独特的优势,如减少了邻近效应,在图案传输方面表现出良好的能力。迄今为止,用于二元图案化的冰光刻技术已经取得了巨大成功,但据我们所知,用于纳米级三维(3D)剖面的冰光刻技术尚未得到应用。本文首次报告了我们在ASW上模拟研究线性炽热光栅三维冰光刻的进展,旨在克服复制高质量、高衍射效率炽热光栅的困难。以 ASW 的测量对比度曲线为基础,使用蒙特卡洛算法对灰度冰光刻进行了系统模拟,以获得所需的表面质量作为任务的三维炽热光栅模板。为了进行比较,还在 PMMA 上进行了灰度电子束光刻。与电子束光刻法相比,灰度电致发光法产生的 1550 纳米波长左右的炽热曲线显示出更少的缺陷和更高的衍射效率。三维灰阶 IL 的成功模拟为我们在 ASW 上通过灰阶冰光刻制造三维纳米结构整体提供了指导。
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来源期刊
Microelectronic Engineering
Microelectronic Engineering 工程技术-工程:电子与电气
CiteScore
5.30
自引率
4.30%
发文量
131
审稿时长
29 days
期刊介绍: Microelectronic Engineering is the premier nanoprocessing, and nanotechnology journal focusing on fabrication of electronic, photonic, bioelectronic, electromechanic and fluidic devices and systems, and their applications in the broad areas of electronics, photonics, energy, life sciences, and environment. It covers also the expanding interdisciplinary field of "more than Moore" and "beyond Moore" integrated nanoelectronics / photonics and micro-/nano-/bio-systems. Through its unique mixture of peer-reviewed articles, reviews, accelerated publications, short and Technical notes, and the latest research news on key developments, Microelectronic Engineering provides comprehensive coverage of this exciting, interdisciplinary and dynamic new field for researchers in academia and professionals in industry.
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