Arnulfo Evangelista, Janella Alfelor-Igtiben, John David Mangali, Khristopherson Cajucom
{"title":"Avalon-Aided Mapping of Fault-Localized Area of ADI’s RADAR Receive Path Analog Front-End (AFE) Amplifier with 0.18um 6-Metal CMOS Fab Process","authors":"Arnulfo Evangelista, Janella Alfelor-Igtiben, John David Mangali, Khristopherson Cajucom","doi":"10.31399/asm.cp.istfa2023p0078","DOIUrl":null,"url":null,"abstract":"Abstract Analog Devices Inc. (ADI)’s Radar Receive Path Analog Front End Amplifier (AFE) with a 0.18um 6-metal Fab Process has failures related to Power-Down and Scan test parameters which were endorsed for Failure Analysis. Fault localization is quite challenging because it involves 6 metal layers. This has been resolved with the availability of Synopsis Avalon software with capability to convert the complete Cadence schematics and layout that is usable for Failure Analysis, through cross-mapping with the fault localized area-of-interest (AOI) on the actual reject part with the die schematics and layout, and identifying the failing component and circuit block. This leads to the creation of the failure model related to the reported failure mode and the determination of the appropriate failure mechanism related to fabrication defects between the adjacent metallization layers and defects on between the polysilicon and substrate layer. This helps speed up the FA Cycle Time and achieve an accurate failure mechanism, which later resolves the fab defect issue with the Fab process owner.","PeriodicalId":20443,"journal":{"name":"Proceedings","volume":null,"pages":null},"PeriodicalIF":0.0000,"publicationDate":"2023-11-12","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Proceedings","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.31399/asm.cp.istfa2023p0078","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0
Abstract
Abstract Analog Devices Inc. (ADI)’s Radar Receive Path Analog Front End Amplifier (AFE) with a 0.18um 6-metal Fab Process has failures related to Power-Down and Scan test parameters which were endorsed for Failure Analysis. Fault localization is quite challenging because it involves 6 metal layers. This has been resolved with the availability of Synopsis Avalon software with capability to convert the complete Cadence schematics and layout that is usable for Failure Analysis, through cross-mapping with the fault localized area-of-interest (AOI) on the actual reject part with the die schematics and layout, and identifying the failing component and circuit block. This leads to the creation of the failure model related to the reported failure mode and the determination of the appropriate failure mechanism related to fabrication defects between the adjacent metallization layers and defects on between the polysilicon and substrate layer. This helps speed up the FA Cycle Time and achieve an accurate failure mechanism, which later resolves the fab defect issue with the Fab process owner.