Со(ІІ) and Ni(II) Removal from Aqueous Solutions by Polymer and Polymer/Silica Adsorbents with Sulfo and Carboxyl groups

IF 1.2 4区 化学 Q3 CHEMISTRY, MULTIDISCIPLINARY
Mariia Zhyhailo, Oksana Demchyna, Iryna Yevchuk, Oksana Makota
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引用次数: 0

Abstract

Sulfo and carboxyl group-containing polymers and polymer/silica adsorbents poly(acrylonitrile-co-2-acrylamido-2-methylpropane-1-sulfonic acid-co-acrylic acid-co-N,N’-methylene-bis-acrylamide) [poly(AN-co-AMPS-co-AAco-MBA)] and poly(AN-co-AMPS-co-AA-co-MBA)/SiO2 were synthesized by a UV-initiated polymerization or simultaneous UV-initiated polymerization and in situ sol-gel process and used as adsorbents for removal of Co(II) and Ni(II) ions from aqueous solutions. The adsorption capacity and the effect of the pH in the removal process have been studied. The poly(AN-co-AMPS-co-AA-co-MBA) adsorbent exhibited high efficiency: up to 91.8 % removal of Co(II) and 89.7 % removal of Ni(II). Polymer/silica adsorbents showed higher removal capacity as compared to pure polymer. The adsorption kinetics of Co(II) and Ni(II) ions were found to be satisfactorily described by the pseudo-second-order reaction equation of the Lagergren kinetic model, suggesting the ion-exchange nature of the process.
Со(ІІ)和含亚砜和羧基的聚合物和聚合物/二氧化硅吸附剂对水溶液中Ni(II)的去除
采用紫外光引发聚合或同步紫外光引发聚合和原位溶胶-凝胶法合成了含磺基和羧基的聚合物和聚合物/二氧化硅吸附剂聚(丙烯腈- Co -2-丙烯酰胺-2-甲基丙烷-1-磺酸-共丙烯酸- Co -N,N ' -亚甲基-双丙烯酰胺)[聚(AN-co-AMPS-co-AAco-MBA)]和聚(AN-co-AMPS-co-AA-co-MBA)/SiO2,并将其用作去除水溶液中Co(II)和Ni(II)离子的吸附剂。研究了吸附量和pH对去除过程的影响。聚(an - Co - amp - Co - aa - Co - mba)吸附剂对Co(II)的去除率高达91.8%,对Ni(II)的去除率高达89.7%。与纯聚合物相比,聚合物/二氧化硅吸附剂具有更高的去除能力。Co(II)和Ni(II)离子的吸附动力学可以用Lagergren动力学模型的拟二级反应方程满意地描述,表明该过程具有离子交换性质。
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来源期刊
Acta Chimica Slovenica
Acta Chimica Slovenica 化学-化学综合
CiteScore
2.50
自引率
25.00%
发文量
80
审稿时长
1.0 months
期刊介绍: Is an international, peer-reviewed and Open Access journal. It provides a forum for the publication of original scientific research in all fields of chemistry and closely related areas. Reviews, feature, scientific and technical articles, and short communications are welcome.
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