Influence of Gate Depletion Layer Width on Radiation Resistance of Silicon Carbide Junction Field-Effect Transistors

IF 1.3 Q3 INSTRUMENTS & INSTRUMENTATION
Akinori Takeyama, Takahiro Makino, Yasunori Tanaka, Shin-Ichiro Kuroki, Takeshi Ohshima
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引用次数: 0

Abstract

Silicon carbide junction field-effect transistors (SiC JFETs) are promising candidates as devices applicable to radiation conditions, such as the decommissioning of nuclear facilities or the space environment. We investigate the origin of the threshold volage (Vth) shift and hysteresis of differently structured SiC JFETs. A large positive Vth shift and hysteresis are observed for a depletion-type JFET with a larger depletion layer width. With changing the sweep range of the gate voltage and depletion width, the Vth shift was positively proportional to the difference between the channel depth and depletion width (channel depth–gate depletion width). By illuminating the sub-band gap light, the Vth of the irradiated depletion JFETs recovers close to nonirradiated ones, while a smaller shift and hysteresis are observed for the enhancement type with a narrower width. It can be interpreted that positive charges generated in a gate depletion layer cause a positive Vth shift. When they are swept out from the depletion layer and trapped in the channel, this gives rise to a further Vth shift and hysteresis in gamma-irradiated SiC JFETs.
栅极耗尽层宽度对碳化硅结场效应晶体管辐射电阻的影响
碳化硅结场效应晶体管(SiC jfet)作为适用于辐射条件的器件,如核设施退役或空间环境,是有希望的候选者。我们研究了不同结构SiC jfet的阈值电压(Vth)漂移和迟滞的来源。在损耗层宽度较大的损耗型JFET中,观察到较大的正Vth位移和滞后。随着栅极电压和耗尽宽度扫频范围的改变,Vth位移与沟道深度和耗尽宽度之差(沟道深度-栅极耗尽宽度)成正比。在亚带隙光照射下,辐照耗尽型jfet的Vth恢复接近于未辐照型,而宽度较窄的增强型则有较小的位移和滞后。这可以解释为在栅极耗尽层中产生的正电荷引起了正的Vth位移。当它们从耗尽层中被扫出并被困在通道中时,这会在γ辐照的SiC jfet中产生进一步的v移和滞后。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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来源期刊
CiteScore
2.80
自引率
28.60%
发文量
27
审稿时长
11 weeks
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