Manufacturing of Tungsten Micro-tools by Electrochemical Etching: Study of the Electrical Parameters

Q3 Engineering
Asmae Tafraouti, Pascal Kleimann, Yasmina Layouni
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引用次数: 0

Abstract

Introduction: This paper aims to fabricate the high aspect ratio tungsten micro-tools with diameters up to 80µm by electrochemical etching. This process is simple and easy to develop, but it requires a deep study to achieve the fabrication of micro-tools with a diameter of 5 µm. Methods: In this work, we studied the effect of the pulsed signal parameters used during the electrochemical etching. The parameters studied are VON and TOFF (The applied voltage and the rest phase, respectively). Results: The experiments show that VON = 0.5V leads to satisfactory results (validation of the reproducibility, homogeneous etching, and fabrication of micro-tools with a diameter of 80µm with an initial tungsten wire diameter of 250µm) by applying an etching charge of 13 C. Voltages VON = 0.1V and VON = 1V does not ensure homogeneous etching. A rest phase TOFF = 3s allows obtaining microtools with a diameter of 80µm in 7 min. For a rest phase of TOFF = 9s, the etching takes 20 min and the micro-tool diameter is almost the same. Conclusion: The results of this study will be used in the manufacture of cylindrical micro-tools with a high aspect ratio Fc > 100.
电化学蚀刻制备钨微型刀具:电学参数的研究
摘要:本文旨在利用电化学刻蚀技术制备直径80 μ m的高纵横比钨微刀具。该工艺简单,易于开发,但需要深入研究才能实现直径为5 μ m的微型工具的制造。方法:研究了电化学刻蚀过程中脉冲信号参数的影响。研究的参数为VON和TOFF(分别为外加电压和剩余相位)。结果:实验表明,VON = 0.5V时,施加13 c的刻蚀电荷,可以获得满意的结果(验证再现性,均匀刻蚀,以及制作直径为80µm的微型工具,初始钨丝直径为250µm)。电压VON = 0.1V和VON = 1V不能保证均匀刻蚀。休息相位TOFF = 3s允许在7分钟内获得直径为80µm的微刀具。对于休息相位TOFF = 9s,蚀刻需要20分钟,微刀具直径几乎相同。结论:本研究成果可用于高纵横比Fc >One hundred.
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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来源期刊
Micro and Nanosystems
Micro and Nanosystems Engineering-Building and Construction
CiteScore
1.60
自引率
0.00%
发文量
50
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