Sofia Tahir, Rabia Saeed, Arslan Ashfaq, Adnan Ali, Khalid Mehmood, Nouf Almousa, Elsammani Ali Shokralla, Romulo R. Macadangdang Jr., Anastasia H. Soeriyadi, Ruy Sebastian Bonilla
{"title":"Optical modeling and characterization of bifacial SiNx/AlOx dielectric layers for surface passivation and antireflection in PERC","authors":"Sofia Tahir, Rabia Saeed, Arslan Ashfaq, Adnan Ali, Khalid Mehmood, Nouf Almousa, Elsammani Ali Shokralla, Romulo R. Macadangdang Jr., Anastasia H. Soeriyadi, Ruy Sebastian Bonilla","doi":"10.1002/pip.3745","DOIUrl":null,"url":null,"abstract":"<p>In this research, we analyzed the impact that the optical characteristics of dielectric surface passivation and antireflection coating schemes have on the performance of passivated emitter and rear cell (PERC) silicon solar cells. We employed wafer ray tracer (WRT) and automate for simulation of heterostructure (AFORS-HET) simulations, as well as experimental characterization of fabricated thin film coatings. We investigated three distinct front surface morphologies: planar surface, upright pyramids, and inverted pyramids. Using WRT, we calculated the photogeneration current densities (J<sub>G</sub>) for PERC devices with three schemes: (i) SiN<sub>x</sub>/AlO<sub>x</sub> as antireflection coating and passivation stacks on both the front and rear sides, (ii) SiN<sub>x</sub> antireflection coating on the front side and AlO<sub>x</sub> passivation layer on the rear side, and (iii) SiN<sub>x</sub>/AlO<sub>x</sub> as antireflection coating and passivation stacks on the front side with an AlO<sub>x</sub> passivation layer on the rear side. Following simulation with optimal J<sub>G</sub>, two schemes are experimentally evaluated: PECVD SiN<sub>x</sub> (70 nm) and atomic layer deposition (ALD) AlO<sub>x</sub> (15 and 25 nm). We confirmed the growth effects and optical properties using X-ray diffraction, Raman spectroscopy, effective lifetime, and refractive index measurements. The most favorable electrical properties were obtained with SiN<sub>x</sub> (70 nm, front) and AlO<sub>x</sub> (25 nm, front and rear), where the AlO<sub>x</sub> can be deposited via ALD bifacially on a single step, minimizing processing while maintaining passivation performance. Finally, we used AFORS-HET to simulate the maximum performance of PERC bearing such films. The results showed a V<sub>oc</sub> = 0.688 V, J<sub>sc</sub> = 41.42 mA/cm<sup>2</sup>, FF = 84%, and packing conversion efficiency (PCE) = 24.12% as the optimal solar cell performance values.</p>","PeriodicalId":223,"journal":{"name":"Progress in Photovoltaics","volume":"32 2","pages":"63-72"},"PeriodicalIF":8.0000,"publicationDate":"2023-10-02","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Progress in Photovoltaics","FirstCategoryId":"88","ListUrlMain":"https://onlinelibrary.wiley.com/doi/10.1002/pip.3745","RegionNum":2,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q1","JCRName":"ENERGY & FUELS","Score":null,"Total":0}
引用次数: 0
Abstract
In this research, we analyzed the impact that the optical characteristics of dielectric surface passivation and antireflection coating schemes have on the performance of passivated emitter and rear cell (PERC) silicon solar cells. We employed wafer ray tracer (WRT) and automate for simulation of heterostructure (AFORS-HET) simulations, as well as experimental characterization of fabricated thin film coatings. We investigated three distinct front surface morphologies: planar surface, upright pyramids, and inverted pyramids. Using WRT, we calculated the photogeneration current densities (JG) for PERC devices with three schemes: (i) SiNx/AlOx as antireflection coating and passivation stacks on both the front and rear sides, (ii) SiNx antireflection coating on the front side and AlOx passivation layer on the rear side, and (iii) SiNx/AlOx as antireflection coating and passivation stacks on the front side with an AlOx passivation layer on the rear side. Following simulation with optimal JG, two schemes are experimentally evaluated: PECVD SiNx (70 nm) and atomic layer deposition (ALD) AlOx (15 and 25 nm). We confirmed the growth effects and optical properties using X-ray diffraction, Raman spectroscopy, effective lifetime, and refractive index measurements. The most favorable electrical properties were obtained with SiNx (70 nm, front) and AlOx (25 nm, front and rear), where the AlOx can be deposited via ALD bifacially on a single step, minimizing processing while maintaining passivation performance. Finally, we used AFORS-HET to simulate the maximum performance of PERC bearing such films. The results showed a Voc = 0.688 V, Jsc = 41.42 mA/cm2, FF = 84%, and packing conversion efficiency (PCE) = 24.12% as the optimal solar cell performance values.
期刊介绍:
Progress in Photovoltaics offers a prestigious forum for reporting advances in this rapidly developing technology, aiming to reach all interested professionals, researchers and energy policy-makers.
The key criterion is that all papers submitted should report substantial “progress” in photovoltaics.
Papers are encouraged that report substantial “progress” such as gains in independently certified solar cell efficiency, eligible for a new entry in the journal''s widely referenced Solar Cell Efficiency Tables.
Examples of papers that will not be considered for publication are those that report development in materials without relation to data on cell performance, routine analysis, characterisation or modelling of cells or processing sequences, routine reports of system performance, improvements in electronic hardware design, or country programs, although invited papers may occasionally be solicited in these areas to capture accumulated “progress”.