Fabrication, swift heavy ion irradiation, and damage analysis of lanthanide targets

IF 1.4 3区 化学 Q4 CHEMISTRY, INORGANIC & NUCLEAR
Carl-Christian Meyer, Ernst Artes, Markus Bender, Joachim Brötz, Christoph E. Düllmann, Constantin Haese, Egon Jäger, Birgit Kindler, Bettina Lommel, Marton Major, Maximilian Rapps, Dennis Renisch, Christina Trautmann, Alexander Yakushev
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Abstract

Abstract One limiting factor in progress in the discovery and study of new superheavy elements (SHE) is the maximum achievable thickness and irradiation stability of current generation actinide targets. The desired thickness of targets, using full excitation function widths, cannot be achieved with current target technology, especially the widely used molecular plating (MP). The aim of this study was to transfer progress in the electrochemistry of lanthanides and actinides to the production of targets. Here, we report on the production of lanthanide targets using anhydrous electrochemical routes. In a first irradiation series, thulium thin films with areal densities up to 1800 μg/cm 2 were produced using anhydrous triflate compounds and subjected to irradiation tests, using 6.0 MeV/u 48 Ca ions at a fluence of 3.9 × 10 14 ions/cm 2 and 8.6 MeV/u 197 Au ions at fluences in the range of 3.0 × 10 11 to 1.0 × 10 13 ions/cm 2 . The thin films were characterised before and after the irradiations using scanning electron microscopy (SEM) and energy dispersive X-ray spectroscopy (EDX).
镧系靶材的制备、快速重离子辐照及损伤分析
新超重元素(SHE)的发现和研究进展中的一个限制因素是当前一代锕系元素靶的最大可实现厚度和辐照稳定性。目前的靶材技术,特别是广泛应用的分子电镀技术,无法实现靶材的全激发函数宽度的期望厚度。本研究的目的是将镧系元素和锕系元素的电化学进展转移到靶物质的生产中。在这里,我们报道了使用无水电化学路线生产镧系靶。在第一个辐照系列中,使用无水三氟酸盐化合物生产了面密度高达1800 μg/ cm2的铥薄膜,并进行了辐照试验,使用6.0 MeV/u 48 Ca离子,影响范围为3.9 × 10 14离子/ cm2,使用8.6 MeV/u 197 Au离子,影响范围为3.0 × 10 11至1.0 × 10 13离子/ cm2。利用扫描电镜(SEM)和能量色散x射线能谱(EDX)对辐照前后的薄膜进行了表征。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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来源期刊
Radiochimica Acta
Radiochimica Acta 化学-核科学技术
CiteScore
2.90
自引率
16.70%
发文量
78
审稿时长
6 months
期刊介绍: Radiochimica Acta publishes manuscripts encompassing chemical aspects of nuclear science and technology.
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