{"title":"Deep core level hard X‐ray photoelectron spectroscopy for catalyst characterization","authors":"Filippo Longo, Marin Nikolic, Andreas Borgschulte","doi":"10.1002/sia.7267","DOIUrl":null,"url":null,"abstract":"Abstract Heterogeneous catalysts are the crucial element for many catalytic processes. In most of the cases, the pivotal structure consists of catalytic metals/alloy particles supported by oxides. Knowledge of the interaction between metal and oxide is central to understand the structure–performance relationship of such systems. X‐ray photoelectron spectroscopy provides access to the chemical–physical properties of metal and oxide interface as well as polarization effects. The results are usually derived from changes of the measured binding energies based on initial state analysis. We propose to extend the analysis using photoelectron as well as Auger transition to include final state effects (Wagner/Hohlneichner plots). This gives additional information on the specific chemical neighborhood of the excited atom. Three archetypal systems are investigated by hard X‐ray photoelectron spectroscopy (HAXPES) to introduce two approaches to this analysis for the most common support elements Al and Si.","PeriodicalId":22062,"journal":{"name":"Surface and Interface Analysis","volume":null,"pages":null},"PeriodicalIF":1.6000,"publicationDate":"2023-11-07","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Surface and Interface Analysis","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1002/sia.7267","RegionNum":4,"RegionCategory":"化学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q4","JCRName":"CHEMISTRY, PHYSICAL","Score":null,"Total":0}
引用次数: 0
Abstract
Abstract Heterogeneous catalysts are the crucial element for many catalytic processes. In most of the cases, the pivotal structure consists of catalytic metals/alloy particles supported by oxides. Knowledge of the interaction between metal and oxide is central to understand the structure–performance relationship of such systems. X‐ray photoelectron spectroscopy provides access to the chemical–physical properties of metal and oxide interface as well as polarization effects. The results are usually derived from changes of the measured binding energies based on initial state analysis. We propose to extend the analysis using photoelectron as well as Auger transition to include final state effects (Wagner/Hohlneichner plots). This gives additional information on the specific chemical neighborhood of the excited atom. Three archetypal systems are investigated by hard X‐ray photoelectron spectroscopy (HAXPES) to introduce two approaches to this analysis for the most common support elements Al and Si.
期刊介绍:
Surface and Interface Analysis is devoted to the publication of papers dealing with the development and application of techniques for the characterization of surfaces, interfaces and thin films. Papers dealing with standardization and quantification are particularly welcome, and also those which deal with the application of these techniques to industrial problems. Papers dealing with the purely theoretical aspects of the technique will also be considered. Review articles will be published; prior consultation with one of the Editors is advised in these cases. Papers must clearly be of scientific value in the field and will be submitted to two independent referees. Contributions must be in English and must not have been published elsewhere, and authors must agree not to communicate the same material for publication to any other journal. Authors are invited to submit their papers for publication to John Watts (UK only), Jose Sanz (Rest of Europe), John T. Grant (all non-European countries, except Japan) or R. Shimizu (Japan only).