Vanadium promoted ZnO films: effects on optical and photocatalytic properties

IF 2.4 4区 材料科学 Q3 MATERIALS SCIENCE, COATINGS & FILMS
Cemre Avşar, Gurkan Karakas
{"title":"Vanadium promoted ZnO films: effects on optical and photocatalytic properties","authors":"Cemre Avşar, Gurkan Karakas","doi":"10.1080/02670844.2023.2264530","DOIUrl":null,"url":null,"abstract":"ABSTRACTThe effect of electrodeposition temperature, vanadium doping, and oxidation state of vanadium on the photocatalytic activity of ZnO thin films over ITO substrates were investigated. NH4VO3 aqueous solution was used as precursor to dope ZnO thin film samples with V5+ by dip coating method and oxalic acid was used as reducing agent to synthesize V+4 doped samples. UV-Vis spectroscopy was used to determine the direct and indirect band gap values of thin film samples. Methylene blue (MB) degradation assays were used to evaluate the photocatalytic activity. XPS analysis was used to determine the analyse oxidation state of vanadium over the samples. Photocatalytic activity studies revealed that ZnO samples electrodeposited at 70°C have higher band gap and MB degradation activity under artificial solar irradiation. The presence of vanadium also enhances the photocatalytic activity of ZnO and samples doped with V+4 have higher photocatalytic activity than the samples doped with V+5 sites.KEYWORDS: ZnOfilmelectrodepositionvanadiumdopingoxidationphotocatalyticactivity Disclosure statementNo potential conflict of interest was reported by the author(s).","PeriodicalId":21995,"journal":{"name":"Surface Engineering","volume":"48 1","pages":"0"},"PeriodicalIF":2.4000,"publicationDate":"2023-10-07","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Surface Engineering","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1080/02670844.2023.2264530","RegionNum":4,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q3","JCRName":"MATERIALS SCIENCE, COATINGS & FILMS","Score":null,"Total":0}
引用次数: 0

Abstract

ABSTRACTThe effect of electrodeposition temperature, vanadium doping, and oxidation state of vanadium on the photocatalytic activity of ZnO thin films over ITO substrates were investigated. NH4VO3 aqueous solution was used as precursor to dope ZnO thin film samples with V5+ by dip coating method and oxalic acid was used as reducing agent to synthesize V+4 doped samples. UV-Vis spectroscopy was used to determine the direct and indirect band gap values of thin film samples. Methylene blue (MB) degradation assays were used to evaluate the photocatalytic activity. XPS analysis was used to determine the analyse oxidation state of vanadium over the samples. Photocatalytic activity studies revealed that ZnO samples electrodeposited at 70°C have higher band gap and MB degradation activity under artificial solar irradiation. The presence of vanadium also enhances the photocatalytic activity of ZnO and samples doped with V+4 have higher photocatalytic activity than the samples doped with V+5 sites.KEYWORDS: ZnOfilmelectrodepositionvanadiumdopingoxidationphotocatalyticactivity Disclosure statementNo potential conflict of interest was reported by the author(s).
钒对ZnO薄膜光学及光催化性能的影响
摘要研究了电沉积温度、钒掺杂和钒氧化态对ZnO薄膜在ITO衬底上光催化活性的影响。以NH4VO3水溶液为前驱体浸包法制备ZnO薄膜样品,以草酸为还原剂合成V+4掺杂样品。采用紫外可见光谱法测定薄膜样品的直接带隙值和间接带隙值。用亚甲基蓝(MB)降解试验评价了其光催化活性。用XPS法测定样品上钒的分析氧化态。光催化活性研究表明,70℃电沉积的ZnO样品在人工太阳照射下具有较高的带隙和MB降解活性。钒的存在也增强了ZnO的光催化活性,掺杂V+4的样品比掺杂V+5的样品具有更高的光催化活性。关键词:zno薄膜电沉积钒掺杂氧化光催化活性披露声明作者未报告潜在利益冲突。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
求助全文
约1分钟内获得全文 求助全文
来源期刊
Surface Engineering
Surface Engineering 工程技术-材料科学:膜
CiteScore
5.60
自引率
14.30%
发文量
51
审稿时长
2.3 months
期刊介绍: Surface Engineering provides a forum for the publication of refereed material on both the theory and practice of this important enabling technology, embracing science, technology and engineering. Coverage includes design, surface modification technologies and process control, and the characterisation and properties of the final system or component, including quality control and non-destructive examination.
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
确定
请完成安全验证×
copy
已复制链接
快去分享给好友吧!
我知道了
右上角分享
点击右上角分享
0
联系我们:info@booksci.cn Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术官方微信