Exploring the Key Mechanism of Superlubricity Behavior of DLC Film in Vacuum Environment Based on First-Principles Calculations and Molecular Dynamics Simulation

IF 3.3 3区 工程技术 Q2 ENGINEERING, CHEMICAL
Yunhai Liu, Hu Zhang, Xiaowen Wang, Yiyao Luo
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Abstract

The key mechanisms for the superlubricity of the DLC film in a vacuum environment are considered to be the formation of graphitization at the friction interface and the carbon dangling bonds on the surface of the H-passivated film. However, how the graphitization and H-passivation mechanisms affect the superlubricity of DLC films in a vacuum environment has not been uniformly understood. This paper attempts to explore the influence of the H-passivation and graphitization mechanism on the frictional properties of DLC films by means of first-principles calculations and molecular dynamics simulation and provides an atomic-level view of the super-slip mechanism of DLC films in a vacuum environment. The results show that the separation work of G/C (2.77 J/m2) and C/H–C (0.19 J/m2) is reduced by 80% and 98%, respectively, compared to C/C (13.52 J/m2). However, it is interesting to note that the separation work of the G/H–C interface (0.51 J/m2) is 168% higher than that of the C/H–C interface (0.19 J/m2). The results of the molecular dynamics simulation also show that the C/H–C interface maintains a small and stable frictional force due to the lower interface slip and the lower temperature rise of the interface. Further investigations revealed that the main reason for the higher separation work is the high charge transfer between the G/H–C interface. In short, the H-passivation in a vacuum environment is the key mechanism that determines the superlubricity of DLC films.

Abstract Image

基于第一性原理计算和分子动力学模拟的DLC膜在真空环境下超润滑行为关键机理探讨
真空环境下DLC膜超润滑的关键机理是摩擦界面石墨化的形成和表面碳悬垂键的形成。然而,石墨化和h钝化机制如何影响DLC薄膜在真空环境下的超润滑性还没有统一的认识。本文试图通过第一性原理计算和分子动力学模拟,探讨h钝化和石墨化机理对DLC膜摩擦性能的影响,并从原子水平上探讨真空环境下DLC膜的超滑移机理。结果表明,与C/C (13.52 J/m2)相比,G/C (2.77 J/m2)和C/ H-C (0.19 J/m2)的分离功分别降低80%和98%。然而,有趣的是,G/ H-C界面的分离功(0.51 J/m2)比C/ H-C界面的分离功(0.19 J/m2)高168%。分子动力学模拟结果还表明,由于界面滑移较小,界面温升较低,C/ H-C界面保持了小而稳定的摩擦力。进一步的研究表明,高分离功的主要原因是G/ H-C界面之间的高电荷转移。总之,真空环境下的h钝化是决定DLC膜超润滑性的关键机制。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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来源期刊
Tribology Letters
Tribology Letters 工程技术-工程:化工
CiteScore
5.30
自引率
9.40%
发文量
116
审稿时长
2.5 months
期刊介绍: Tribology Letters is devoted to the development of the science of tribology and its applications, particularly focusing on publishing high-quality papers at the forefront of tribological science and that address the fundamentals of friction, lubrication, wear, or adhesion. The journal facilitates communication and exchange of seminal ideas among thousands of practitioners who are engaged worldwide in the pursuit of tribology-based science and technology.
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