C. Ionescu, D. Copot, A. Maxim, E. Dulf, R. Both, R. Keyser
{"title":"Robust autotuning MPC for a class of process control applications","authors":"C. Ionescu, D. Copot, A. Maxim, E. Dulf, R. Both, R. Keyser","doi":"10.1109/AQTR.2016.7501356","DOIUrl":null,"url":null,"abstract":"This paper introduces a robust methodology for autotuning design parameters in the EPSAC (Extended Prediction Self-Adaptive Control) approach to MPC (Model based Predictive Control). The method requires from the user solely a well-chosen sampling period of the process and, in case of process with time delay, the amount of delayed samples. The main design parameter, the prediction horizon, is related to the open loop dynamics of the system and set to a relatively large value for a robust control performance. Process model is obtained apriori from step response in presence of 20% noise and later updated during closed loop simulations. The results indicate in both simulation and experimental study that the methodology is suitable for some classes of chemical processes or other processes with similar dynamic profiles.","PeriodicalId":110627,"journal":{"name":"2016 IEEE International Conference on Automation, Quality and Testing, Robotics (AQTR)","volume":"333 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2016-05-19","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"6","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2016 IEEE International Conference on Automation, Quality and Testing, Robotics (AQTR)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/AQTR.2016.7501356","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 6
Abstract
This paper introduces a robust methodology for autotuning design parameters in the EPSAC (Extended Prediction Self-Adaptive Control) approach to MPC (Model based Predictive Control). The method requires from the user solely a well-chosen sampling period of the process and, in case of process with time delay, the amount of delayed samples. The main design parameter, the prediction horizon, is related to the open loop dynamics of the system and set to a relatively large value for a robust control performance. Process model is obtained apriori from step response in presence of 20% noise and later updated during closed loop simulations. The results indicate in both simulation and experimental study that the methodology is suitable for some classes of chemical processes or other processes with similar dynamic profiles.