A novel probe station for helium temperature measurements

H. Geissler, A. Rumiantsev, S. Schott, P. Sakalas, M. Schroter
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Abstract

A novel automated wafer-level RF measurement system is presented. It includes a wafer prober and dedicated on-wafer probe tips and calibration standards. Probe station related design issues are discussed leading to a system for automated testing of wafers up to 300mm by using a programmable positioning stage. Using on-wafer SiGe HBT measurements, noise characterization and VNA calibration verification, the long-term stability and reliability of the setup is illustrated. Tests are carried out both with liquid nitrogen as well as liquid helium as coolant, equal to temperature range from 400K down to 4K.
一种新型氦温度测量探测站
提出了一种新型的自动化晶圆级射频测量系统。它包括一个晶圆探头和专用的晶圆探头尖端和校准标准。讨论了探头台的相关设计问题,并通过使用可编程定位台实现对高达300mm的晶圆的自动测试。通过片上SiGe HBT测量、噪声表征和VNA校准验证,说明了该装置的长期稳定性和可靠性。测试以液氮和液氦作为冷却剂进行,温度范围从400K到4K。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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