High-Sensitivity Picosecond-Response InxGa1-xAs Photodetectors

S. Gupta, J. Whitaker, S. Williamson, P. Ho, J. Mazurowski, J. Ballingall
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Abstract

For ultrafast optoelectronic applications, photoconductors with sub-picosecond carrier lifetimes and low dark current are desired. Previous work has demonstrated the dramatic reduction in the carrier lifetime by lowering the growth temperature to ~200°C in molecular-beam-epitaxial (MBE) GaAs layers [1]. Optical transmission and reflection measurements, and photoconductive switching measurements have confirmed the sub-picosecond carrier lifetime in this material. In addition, the semi-insulating nature and high breakdown voltage of these layers has enabled the fabrication of submicron interdigitated photodetectors and optical correlators having an unprecedented bandwidth of 375 GHz and responsivity of ~ 0.1 A/W [2]. The excess-As incorporation during the low-temeprature MBE growth is believed to lead to the above properties [3], hence this approach of low-temperature growth should be applicable to other As-based materials. In particular, the ternary compound InxGa1-xAs is an important direct band-gap material for the long wavelength region, and with this in mind we investigate the ultrafast carrier dynamics and applications of low-temperature MBE grown InxGa1-xAs epilayers.
高灵敏度皮秒响应InxGa1-xAs光电探测器
对于超快光电应用,需要具有亚皮秒载流子寿命和低暗电流的光导体。先前的研究表明,在分子束外延(MBE) GaAs层[1]中,通过将生长温度降低到~200°C,载流子寿命显著降低。光传输和反射测量以及光导开关测量证实了该材料的亚皮秒载流子寿命。此外,这些层的半绝缘性质和高击穿电压使得制造亚微米交叉光电探测器和光相关器具有前所未有的375 GHz带宽和~ 0.1 A/W[2]的响应率。在低温MBE生长过程中过量的as掺入被认为是导致上述性能[3]的原因,因此这种低温生长方法应该适用于其他as基材料。特别是,三元化合物InxGa1-xAs是长波区重要的直接带隙材料,有鉴于此,我们研究了低温MBE生长的InxGa1-xAs薄膜的超快载流子动力学和应用。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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