{"title":"Vacancies in as-grown and electron irradiated α-SiO2","authors":"S. Dannefaer, D. Craigen, D. Kerr","doi":"10.1364/bgppf.1997.jma.8","DOIUrl":null,"url":null,"abstract":"Positron annihilation is a technique uniquely suited to detect vacancies independent of whether they are EPR active or not. In α-SiO2 it has long been suspected that EPR inactive precursors should exist for the E’ centre. Here we show that vacancies are indeed present in as-grown α-SiO2 at a concentration of ~1017/cm3. About 1000 °C these vacancies migrate whereup they form vacancy clusters. 2 MeV electron irradiation introduces additional vacancies but at a highly nonlinear rate. The introduction rate decreases abruptly by a factor of 5 around a dose of 1017e−/cm2. The irradiation-produced vacancies are annealed out at 500 °C well below that for the vacancies in the as-grown α-SiO2. We ascribe the 500 °C annealing stage to recombination with interstitials closely associated with the irradiation-produced vacancies.","PeriodicalId":182420,"journal":{"name":"Bragg Gratings, Photosensitivity, and Poling in Glass Fibers and Waveguides: Applications and Fundamentals","volume":"7 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Bragg Gratings, Photosensitivity, and Poling in Glass Fibers and Waveguides: Applications and Fundamentals","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1364/bgppf.1997.jma.8","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0
Abstract
Positron annihilation is a technique uniquely suited to detect vacancies independent of whether they are EPR active or not. In α-SiO2 it has long been suspected that EPR inactive precursors should exist for the E’ centre. Here we show that vacancies are indeed present in as-grown α-SiO2 at a concentration of ~1017/cm3. About 1000 °C these vacancies migrate whereup they form vacancy clusters. 2 MeV electron irradiation introduces additional vacancies but at a highly nonlinear rate. The introduction rate decreases abruptly by a factor of 5 around a dose of 1017e−/cm2. The irradiation-produced vacancies are annealed out at 500 °C well below that for the vacancies in the as-grown α-SiO2. We ascribe the 500 °C annealing stage to recombination with interstitials closely associated with the irradiation-produced vacancies.