0.25 /spl mu/m low power CMOS devices and circuits from 8 inch SOI materials

B. Chen, A.S. Yapsir, S. Wu, R. Schulz, D. Yee, D. Sadana, H. Hovel, T. Ning, G. Shahidi, B. Davari
{"title":"0.25 /spl mu/m low power CMOS devices and circuits from 8 inch SOI materials","authors":"B. Chen, A.S. Yapsir, S. Wu, R. Schulz, D. Yee, D. Sadana, H. Hovel, T. Ning, G. Shahidi, B. Davari","doi":"10.1109/ICSICT.1995.500080","DOIUrl":null,"url":null,"abstract":"0.25 /spl mu/m SOI-CMOS ring oscillators, various circuits and SRAM from 8-inch SIMOX wafers are reported. Both active power and stand-by leakage are compared on fully integrated lots for both SOI and bulk materials. The great advantage of SOI for active power reduction is demonstrated for various circuits. Stand-by leakage paths have been systematically studied on their dependence on material, process integration and devices. Potential solutions to reduce each stand-by leakage current are discussed. From these early 8-inch SIMOX materials, encouraging results suggest that low stand-by power can be achieved by optimizations of SOI material preparation, process integration and device design.","PeriodicalId":286176,"journal":{"name":"Proceedings of 4th International Conference on Solid-State and IC Technology","volume":"85 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1995-10-24","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"5","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Proceedings of 4th International Conference on Solid-State and IC Technology","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ICSICT.1995.500080","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 5

Abstract

0.25 /spl mu/m SOI-CMOS ring oscillators, various circuits and SRAM from 8-inch SIMOX wafers are reported. Both active power and stand-by leakage are compared on fully integrated lots for both SOI and bulk materials. The great advantage of SOI for active power reduction is demonstrated for various circuits. Stand-by leakage paths have been systematically studied on their dependence on material, process integration and devices. Potential solutions to reduce each stand-by leakage current are discussed. From these early 8-inch SIMOX materials, encouraging results suggest that low stand-by power can be achieved by optimizations of SOI material preparation, process integration and device design.
0.25 /spl mu/m低功耗CMOS器件和电路,采用8英寸SOI材料
报道了0.25 /spl mu/m的SOI-CMOS环形振荡器、各种电路和8英寸SIMOX晶圆的SRAM。在SOI和散装材料的完全集成批次上对有功功率和备用泄漏进行了比较。SOI在降低有功功率方面的巨大优势在各种电路中得到了证明。系统地研究了备用泄漏路径对材料、工艺集成和器件的依赖性。讨论了降低各种待机泄漏电流的可能解决方案。从这些早期的8英寸SIMOX材料来看,令人鼓舞的结果表明,通过优化SOI材料制备、工艺集成和器件设计,可以实现低待机功率。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
求助全文
约1分钟内获得全文 求助全文
来源期刊
自引率
0.00%
发文量
0
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
确定
请完成安全验证×
copy
已复制链接
快去分享给好友吧!
我知道了
右上角分享
点击右上角分享
0
联系我们:info@booksci.cn Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号:604180095
Book学术官方微信