Laser scanning confocal IR microscopy for non-destructive testing of semiconductors

Abstract

The article discusses characteristics of the laser scanning confocal IR microscope being developed for applications of non-destructive testing of semiconductor structures. The existing methods and analysis facilities of integrated circuits are described. In this review, the method of laser confocal IR-microscopy is considered. The laser scanning confocal IR-microscope will make it possible to reconstruct the internal structure of an integrated circuit and identify its materials without special environmental conditions during research, for example, such as vacuum chamber or x-ray facility.