Quality Control And Diagnostic System For LSI Fabrication

Abstract

Improving initial yield is one way to overcome the ever competitive market of semiconductors. To accomplish this, analyzing particle/pattern defects is a method in finding a countermeasure. We have developed a system, from controlling the master parameter setting, derive where and what the problem is. It gathers data from QC data; especially related to particles and pattern defects. This system is completely independent from other systems, thus enabling it to be used in any type of line(e.g. unautomated/automated, large/small.)