Sub-micrometer Hall probes prepared by tip-inducted local anodic oxidation

J. Martaus, V. Cambel, D. Gregušová, R. Kúdela
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Abstract

We developed a technology of room temperature sub-micrometer Hall probes. Such probes can be used to evaluate absolute values of local magnetic fields and to study sub-micrometer magnetic domain structures. The probes based on an optimized shallow InGaP/AIGaAs/GaAs heterostructure, were firstly processed by standard photolithography and wet-chemical etching, and then downsized to sub-micrometer dimensions by tip-induced local anodic oxidation. The magnetic-field resolution of the probes was evaluated. We demonstrate a 200-nm Hall probe with a magnetic-field resolution of 45 muT/(Hz)1/2 at 140 Hz and 4.2 K, driven by 5 muA bias current.
用尖端诱导局部阳极氧化制备亚微米霍尔探针
我们开发了一种室温亚微米霍尔探头技术。这种探针可以用来评估局部磁场的绝对值和研究亚微米磁畴结构。基于优化的InGaP/AIGaAs/GaAs浅层异质结构的探针,首先通过标准光刻和湿化学蚀刻进行加工,然后通过尖端诱导局部阳极氧化将探针缩小到亚微米尺寸。对探针的磁场分辨率进行了评价。我们展示了一个200 nm霍尔探头,在140 Hz和4.2 K下,在5 muA偏置电流驱动下,磁场分辨率为45 muT/(Hz)1/2。
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