Influence of RF-magnetron Sputtering System Parameters on the Process of Thin Films Nanostructure Formation

Abstract

Effect of a radio-frequency magnetron sputtering system parameters on the process of thin films structure formation was analyzed. Dependence of energy delivered to the growing film by bombarding ions on the magnetron parameters and configuration was studied. Main parameters determining this energy are plasma potential, substrate ion current density, substrate bias and deposition rate. It was shown, that energetic conditions sufficiently influence on the structure formation of textured coatings. The influence of discharge gap distance and substrate bias potential on formation of hafnium diboride films structure was studied.