{"title":"Fabrication and testing of vertically-actuated polycrystalline SiC micromechanical resonators for MHz frequency applications","authors":"R. Wiser, C. Zorman, M. Mehregany","doi":"10.1109/SENSOR.2003.1216978","DOIUrl":null,"url":null,"abstract":"Vertically-actuated micromechanical resonators operating at MHz frequencies were fabricated from phosphorus-doped polycrystalline silicon carbide (poly-SiC) films. The films were deposited on thin polysilicon sacrificial layers by atmospheric pressure chemical vapor deposition (APCVD) and surface micromachined into structures using a lift-off patterning technique. The resonators were tested under high vacuum conditions using a transimpedance amplifier-based circuit. The measured resonant frequencies were consistent with what was expected based on device designs and material properties; however, the quality factors were much lower than expected. Equivalent circuit modeling suggested that the low quality factors were due to the electrical resistance of the beams, which was unexpectedly high.","PeriodicalId":196104,"journal":{"name":"TRANSDUCERS '03. 12th International Conference on Solid-State Sensors, Actuators and Microsystems. Digest of Technical Papers (Cat. No.03TH8664)","volume":"39 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2003-06-08","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"3","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"TRANSDUCERS '03. 12th International Conference on Solid-State Sensors, Actuators and Microsystems. Digest of Technical Papers (Cat. No.03TH8664)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/SENSOR.2003.1216978","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 3
Abstract
Vertically-actuated micromechanical resonators operating at MHz frequencies were fabricated from phosphorus-doped polycrystalline silicon carbide (poly-SiC) films. The films were deposited on thin polysilicon sacrificial layers by atmospheric pressure chemical vapor deposition (APCVD) and surface micromachined into structures using a lift-off patterning technique. The resonators were tested under high vacuum conditions using a transimpedance amplifier-based circuit. The measured resonant frequencies were consistent with what was expected based on device designs and material properties; however, the quality factors were much lower than expected. Equivalent circuit modeling suggested that the low quality factors were due to the electrical resistance of the beams, which was unexpectedly high.