Fabrication and testing of vertically-actuated polycrystalline SiC micromechanical resonators for MHz frequency applications

R. Wiser, C. Zorman, M. Mehregany
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引用次数: 3

Abstract

Vertically-actuated micromechanical resonators operating at MHz frequencies were fabricated from phosphorus-doped polycrystalline silicon carbide (poly-SiC) films. The films were deposited on thin polysilicon sacrificial layers by atmospheric pressure chemical vapor deposition (APCVD) and surface micromachined into structures using a lift-off patterning technique. The resonators were tested under high vacuum conditions using a transimpedance amplifier-based circuit. The measured resonant frequencies were consistent with what was expected based on device designs and material properties; however, the quality factors were much lower than expected. Equivalent circuit modeling suggested that the low quality factors were due to the electrical resistance of the beams, which was unexpectedly high.
用于MHz频率应用的垂直驱动多晶SiC微机械谐振器的制造和测试
利用掺磷的多晶碳化硅(poly-SiC)薄膜制备了工作在MHz频率下的垂直驱动微机械谐振器。该薄膜通过常压化学气相沉积(APCVD)沉积在薄多晶硅牺牲层上,并使用上升模式技术将表面微机械加工成结构。谐振器在高真空条件下使用基于跨阻放大器的电路进行测试。测量到的谐振频率与基于器件设计和材料特性的预期一致;然而,质量因素远低于预期。等效电路模型表明,低质量因素是由于梁的电阻,这是出乎意料的高。
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