Modeling of 0.18 μm NMOSFETs for TID effect

Tiehu Li, Yintang Yang, Tao Liu
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引用次数: 1

Abstract

Based on total ionizing dose (TID) irradiation tests, transistor irradiation models for both strip-gate and edgeless structures were created. Only 5% model error was incurred in off state or subthreshold region and a lower 1% error in linear region or saturation region. Edgeless structure was demonstrated to be radiation hardened. The effectiveness of proposed models was validated by application to a reference circuit simulation.
用于TID效应的0.18 μm nmosfet建模
基于总电离剂量(TID)辐照试验,建立了条形栅和无边沿结构的晶体管辐照模型。在关闭状态或阈下区域仅产生5%的模型误差,在线性区域或饱和区域误差较低,为1%。无边结构被证明是辐射硬化的。通过参考电路仿真验证了所提模型的有效性。
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