Xi Wang, A. Shakouri, A. Mavrokefalos, Y. Lee, H. Kong, Li Shi
{"title":"Thermoreflectance imaging measurement of in-plane thermal properties of thin-film structures","authors":"Xi Wang, A. Shakouri, A. Mavrokefalos, Y. Lee, H. Kong, Li Shi","doi":"10.1109/STHERM.2010.5444284","DOIUrl":null,"url":null,"abstract":"The study of thin film thermal properties is an important component of microelectronic and thermoelectric material research. Accurate measurements of such properties, especially in-plane thermal conductivity is known to be challenging. In this paper, we briefly review the thin film inplane thermal conductivity measurement methods that have been developed up to date, and demonstrate a new method with the utilization of thermoreflectance imaging technique. Preliminary measurement results for an InAlGaAs thin film sample are described.","PeriodicalId":111882,"journal":{"name":"2010 26th Annual IEEE Semiconductor Thermal Measurement and Management Symposium (SEMI-THERM)","volume":"14 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2010-04-08","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2010 26th Annual IEEE Semiconductor Thermal Measurement and Management Symposium (SEMI-THERM)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/STHERM.2010.5444284","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 1
Abstract
The study of thin film thermal properties is an important component of microelectronic and thermoelectric material research. Accurate measurements of such properties, especially in-plane thermal conductivity is known to be challenging. In this paper, we briefly review the thin film inplane thermal conductivity measurement methods that have been developed up to date, and demonstrate a new method with the utilization of thermoreflectance imaging technique. Preliminary measurement results for an InAlGaAs thin film sample are described.