Quiescent Drain Voltage Dependence of Pulsed I-V Characteristics of GaN HEMTs: Analysis and Modeling

S. Khandelwal, K. Kellogg, C. Hill, H. Morales, L. Dunleavy, G. Drandova, Anita Pacheco, J. Jimenez
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引用次数: 4

Abstract

This paper presents an analysis on the dependence of the pulsed I-V characteristics of GaN HEMTs under varying quiescent drain voltage (Vdsq) conditions, and a new model is developed for this behavior. It is found that three device parameters change with Vdsq: threshold (or cut-off) voltage, and 2-DEG densities in source and drain side access regions. It is shown that these device parameters have a non-linear dependence on Vdsq. The new model for this non-linear behavior w.r.t Vdsq is validated with measured data for six Vdsq 's for two different GaN technologies. The developed model is also exercised for large signal microwave frequency performance yielding good agreement with measurements and indicating the importance of modeling this trap-related device parameter change with Vdsq. Index Terms—MMIC, power amplifiers, Gallium Nitride, Compact models, GaN trapping effects.
GaN hemt脉冲I-V特性的静态漏极依赖性:分析与建模
本文分析了GaN hemt在不同静态漏极电压(Vdsq)条件下脉冲I-V特性的依赖关系,并建立了该特性的新模型。发现三个器件参数随Vdsq变化:阈值(或截止)电压,源侧和漏侧通路区域的2-DEG密度。结果表明,这些器件参数与Vdsq呈非线性关系。用两种不同GaN技术的6个Vdsq的测量数据验证了这种非线性行为的新模型。所建立的模型也适用于大信号微波频率性能,结果与测量结果吻合良好,表明用Vdsq对陷阱相关器件参数变化进行建模的重要性。索引术语- mmic,功率放大器,氮化镓,紧凑模型,氮化镓捕获效应。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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