Multilayer coatings for optics in the extreme ultraviolet

J. Larruquert, M. Vidal-Dasilva, Sergio García-Cortés, L. R. Rodríguez-de Marcos, M. Fernández-Perea, J. Aznárez, J. A. Méndez
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Abstract

The strong absorption of materials in the extreme ultraviolet (EUV) above ~50 nm has precluded the development of efficient coatings. The development of novel coatings with improved EUV performance is presented. An extensive research was performed on the search and characterization of new materials with low absorption or high reflectance. Lanthanide series was found to be a source of materials with relatively low absorption in this range, where most materials in nature present a strong absorption. Other materials, such as SiO and B, have been found to have interesting properties for applications on EUV coatings. As a result, novel multilayers based on Yb, Al, and SiO have been developed with narrowband performance in the 50-92 nm range. In some cases, the difficulty of developing narrowband coatings in the EUV can be overcome by designing multilayers that address specific purposes, such as maximizing and/or minimizing the reflectance at two or more wavelengths or bands. In this direction, we are working towards the development of coatings that combine a relatively high reflectance in a desired EUV band with a low reflectance in another band, for applications in which the presence of the latter radiation may mask a weak EUV radiation source.
极紫外光学用多层涂层
材料在~50 nm以上的极紫外光(EUV)中的强吸收阻碍了高效涂料的发展。介绍了提高极紫外性能的新型涂层的研究进展。对低吸收或高反射率新材料的寻找和表征进行了广泛的研究。在这个范围内,镧系元素被发现是吸收相对较低的材料来源,而自然界中大多数材料都有很强的吸收。其他材料,如SiO和B,已被发现在EUV涂层上具有有趣的性能。因此,基于Yb, Al和SiO的新型多层材料在50-92 nm范围内具有窄带性能。在某些情况下,可以通过设计满足特定目的的多层膜来克服在EUV中开发窄带涂层的困难,例如最大化和/或最小化两个或多个波长或波段的反射率。在这个方向上,我们正在努力开发一种涂层,将期望的极紫外波段的相对高反射率与另一波段的低反射率结合起来,用于后一种辐射可能掩盖弱极紫外辐射源的应用。
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