{"title":"Flip-chip packaging with micromachined conductive polymer bumps","authors":"K. Oh, C. Ahn","doi":"10.1109/ADHES.1998.742031","DOIUrl":null,"url":null,"abstract":"A new conductive polymer flip-chip bonding technique has been developed and characterized using micromachined conductive polymer bumps. By using UV-based photolithography with thick photoresists, molds for the flip-chip bumps have been patterned, filled with conductive polymers, selectively cured, and then stripped, leaving molded conductive polymer bumps on contact metal pads. After flip-chip bonding with the micromachined conductive polymer bumps, the contact resistances measured for 25 /spl mu/m-high bumps with 300 /spl mu/m/spl times/300 /spl mu/m area and 400 /spl mu/m/spl times/400 /spl mu/m area were 35 m/spl Omega/ and 12 m/spl Omega/, respectively. The conductive polymer flip-chip bonding technique developed in this work showed a very low contact resistance, simple processing steps, a high bumping alignment resolution (","PeriodicalId":183195,"journal":{"name":"Proceedings of 3rd International Conference on Adhesive Joining and Coating Technology in Electronics Manufacturing 1998 (Cat. No.98EX180)","volume":"294 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1998-09-28","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"6","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Proceedings of 3rd International Conference on Adhesive Joining and Coating Technology in Electronics Manufacturing 1998 (Cat. No.98EX180)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ADHES.1998.742031","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 6
Abstract
A new conductive polymer flip-chip bonding technique has been developed and characterized using micromachined conductive polymer bumps. By using UV-based photolithography with thick photoresists, molds for the flip-chip bumps have been patterned, filled with conductive polymers, selectively cured, and then stripped, leaving molded conductive polymer bumps on contact metal pads. After flip-chip bonding with the micromachined conductive polymer bumps, the contact resistances measured for 25 /spl mu/m-high bumps with 300 /spl mu/m/spl times/300 /spl mu/m area and 400 /spl mu/m/spl times/400 /spl mu/m area were 35 m/spl Omega/ and 12 m/spl Omega/, respectively. The conductive polymer flip-chip bonding technique developed in this work showed a very low contact resistance, simple processing steps, a high bumping alignment resolution (