{"title":"Simple Analytical Modelling of an Electronically Tunable Potentiometer and Body Factor Influence","authors":"J. Sousa, J. Martino, P. Agopian","doi":"10.1109/LAEDC51812.2021.9437909","DOIUrl":null,"url":null,"abstract":"This paper presents a simple analytical modelling of a Electronically Tunable Potentiometer (ETP) circuit, made of a pseudo-resistor pair and a feedback mechanism that keeps resistance invariant to common mode voltage. The modelling utilizes the first order quadratic equations for the MOS transistor. In order to validate the analytical model, a Verilog-A model was written using the same MOS equations, and later matched to the ibm 130nm technology node resulting in a satisfactory approximation, with relative errors within 15%. Analysis of the ETP control voltage, pseudo-resistor current and pseudo-resistor resistance using the simple model were performed as a function of body factor. When the body factor decreases (better gate to channel electrostatic coupling) the pseudo-resistance increases for the same silicon chip area.","PeriodicalId":112590,"journal":{"name":"2021 IEEE Latin America Electron Devices Conference (LAEDC)","volume":"4 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2021-04-19","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2021 IEEE Latin America Electron Devices Conference (LAEDC)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/LAEDC51812.2021.9437909","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0
Abstract
This paper presents a simple analytical modelling of a Electronically Tunable Potentiometer (ETP) circuit, made of a pseudo-resistor pair and a feedback mechanism that keeps resistance invariant to common mode voltage. The modelling utilizes the first order quadratic equations for the MOS transistor. In order to validate the analytical model, a Verilog-A model was written using the same MOS equations, and later matched to the ibm 130nm technology node resulting in a satisfactory approximation, with relative errors within 15%. Analysis of the ETP control voltage, pseudo-resistor current and pseudo-resistor resistance using the simple model were performed as a function of body factor. When the body factor decreases (better gate to channel electrostatic coupling) the pseudo-resistance increases for the same silicon chip area.