A method for deposition of tungsten trioxide (WO3)

J. Martínez-Juárez, J. Díaz-Reyes
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引用次数: 2

Abstract

Thin films of tungsten oxide (WO3) have been grown by hot-filament metal oxide deposition (HFMOD) technique under atmospheric pressure and an oxygen atmosphere on glass substrates. The thin film of WO3 has been extensively studied as an electrochromic material and has numerous applications in electrochromic devices. In order to explore the possibility of using WO3 in electrochromic devices, a preliminary and thorough study of the structural and optical properties of the host material is an important step. By the X-ray diffraction analysis the single phase natures, monoclinic and orthorhombic structure of the films have been confirmed. The IR spectra were constituted of many broad peaks in the 1400-3500 cm-1 region That are assigned to ν(OH) and δ(OH) modes of adsorbed water. The corresponding WO3 vibrations are in infrared regions of 1453-400 cm-1 and 3454 cm-1, which correspond to W-O stretching, bending and lattice modes. By Transmittance measures determines that the optical bandgap is around 2.92 eV. We have observed that the good quality WO3 thin films can be satisfactorily grown by this technique.
一种沉积三氧化钨(WO3)的方法
在常压和氧气气氛下,采用热丝金属氧化物沉积(HFMOD)技术在玻璃衬底上生长了氧化钨(WO3)薄膜。WO3薄膜作为一种电致变色材料得到了广泛的研究,在电致变色器件中有着广泛的应用。为了探索在电致变色器件中使用WO3的可能性,对主体材料的结构和光学性质进行初步深入的研究是重要的一步。通过x射线衍射分析,证实了薄膜的单相性质、单斜结构和正交结构。红外光谱在1400 ~ 3500cm -1范围内由ν(OH)和δ(OH)模式的宽峰组成。对应的WO3振动在1453 ~ 400 cm-1和3454 cm-1的红外区域,分别对应W-O拉伸、弯曲和晶格模式。通过透光率测量,确定了光带隙在2.92 eV左右。我们观察到,用这种方法可以令人满意地生长出高质量的WO3薄膜。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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