Intense low-energy electron and ion beams and their application

S. Bugaev, S. Korovin, N. Koval, E. Oks, D. Proskurovsky, N.S. Sochugov
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引用次数: 1

Abstract

This paper presents a review of results obtained at the Institute of High Current Electronics relevant to research and development of intense low-energy (<200 keV) high-current electron and ion beam. sources and powerful plasma sources and their application in technology. Considered are issues of charged particle beam production in vacuum diodes with explosive-emission cathodes, in plasma-filled diodes, diodes based on plasma emitters with low-pressure arcs and grid stabilization of plasma emitting surface, different versions of vacuum arc ion sources to produce multiply charged high current metal ion beams or mixed gaseous and metal ion beams, sources of broad beams of gaseous ions, and plasma guns based on glow-discharge hollow cathode with external electron injection, having wide pressure operation ranges and low discharge voltages. The paper also presents results of application of such beams for sterilization of powder materials, surface treatment, metal surface modification etc.
强低能电子束和离子束及其应用
本文综述了高电流电子学研究所在强低能量(< 200kev)大电流电子束和离子束的研究与开发方面取得的成果。源和强等离子体源及其技术应用。讨论了具有爆炸发射阴极的真空二极管、等离子体填充二极管、基于低压电弧和等离子体发射表面网格稳定的等离子体发射器的二极管、产生多重带电高电流金属离子束或混合气体和金属离子束的不同版本的真空电弧离子源、气体离子宽束源的带电粒子束产生问题。基于外电子注入空心阴极辉光放电的等离子枪具有宽压力工作范围和低放电电压的特点。文中还介绍了这种光束在粉末材料灭菌、表面处理、金属表面改性等方面的应用结果。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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