Temperature dependent hysteretic propagation delay in FB SOI inverter chain

D. Chang, Byonug Min, S. Veeraraghavan, M. Mendicino, T. Cooper, S. Egley, K. Cox
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引用次数: 4

Abstract

The CMOS gate delay on SOI depends on the switching history of floating-body transistors, which introduces uncertainty in predicting the performance of SOI-based circuits (Suh and Fossum, 1994; Shahidi et al., 1999). The main cause of the hysteretic delay is due to the transient variation of the body voltage during switching and the corresponding threshold voltage change. Since the capacitance coupling and generation/recombination currents determining the transient body-voltage are strong functions of temperature, the gate delay is also expected to show a significant temperature dependence. In the measurement of a 610-stage floating-body SOI CMOS open-ended inverter chain, we have observed that the hysteretic gate delay variation is worse at higher temperature for devices which showed pulse compression at room temperature. In this work, we have performed simulations to predict fast/slow gate delays for different SOI device structures versus temperature, and compared these results to measurements, thus illustrating the importance of accounting for temperature in history effects.
fbsoi逆变器链中温度相关的滞回传播延迟
SOI上的CMOS栅极延迟取决于浮体晶体管的开关历史,这在预测基于SOI的电路的性能时引入了不确定性(Suh和Fossum, 1994;Shahidi et al., 1999)。产生滞后延迟的主要原因是开关过程中体电压的瞬态变化和相应的阈值电压的变化。由于电容耦合和产生/复合电流决定瞬态体电压是温度的强函数,因此门延迟也预计会显示出显著的温度依赖性。在对610级浮体SOI CMOS开放式逆变器链的测量中,我们观察到在室温下表现出脉冲压缩的器件在更高温度下的滞回门延迟变化更差。在这项工作中,我们进行了模拟,以预测不同SOI器件结构对温度的快/慢栅极延迟,并将这些结果与测量结果进行了比较,从而说明了在历史效应中考虑温度的重要性。
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