Reconstruction Phase Transition γ(2×4) <-> c(4×4) on (001) GaAs Surface

D. Dmitriev
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Abstract

In present study MBE equipment /spl Lt/Riber-32P/spl Gt/ with solid state sources of materials was used. The RHEED system was applied to get the diffraction patterns on reflection. The RHEED patterns changing let us determine surface reconstruction and sharply tracking reconstructional transitions. The [001] GaAs substrates with dimensional 3/spl times/3 mm/sup 2/ were used. That geometry of samples let reach the high accuracy as assigned in investigated parameters. The elections of conditions of experiment were done in connection with the fact of homoepitaxy on [001] GaAs surface from As/sub 4/ and Ga beam is the modeling system in A/sup 3/B/sup 5/ compound epitaxy. The reconstruction /spl gamma/(2/spl times/4) and c(4/spl times/4) on the [001]GaAs surface is the well example of ordered and disordered structure.
(001) GaAs表面重建相变γ(2×4) c(4×4
本研究采用固态材料源的MBE设备/spl Lt/Riber-32P/spl Gt/。应用RHEED系统得到了反射时的衍射图样。RHEED模式的变化使我们能够确定表面重建并快速跟踪重建过渡。采用尺寸为3/spl × 3 mm/sup /的[001]GaAs衬底。样品的几何形状使其达到所研究参数所指定的高精度。结合As/sub - 4/在[001]GaAs表面同质外延的事实进行了实验条件的选择,Ga束是A/sup 3/B/sup 5/复合外延的建模系统。[001]GaAs表面的重构/spl γ /(2/spl倍/4)和c(4/spl倍/4)是有序和无序结构的很好例子。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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