2.5 kV 100 A /spl mu/-stack IGBT

Y. Takahashi, T. Koga, H. Kirihata, Y. Seki
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引用次数: 10

Abstract

A 2.5 kV 100 A /spl mu/(micro)-stack IGBT has been developed. This is the first work to demonstrate the possibility of a high voltage, high current and high reliable flat-packaged MOS controlled device. The 20 mm square chip is press-contacted with an emitter electrode having four rectangular p-base regions on which the MOS gate is not arranged. The great advantage of this structure is the double side cooling and the bondingless emitter wire. The /spl mu/-stack IGBT shows the high blocking voltage of 2.5 kV, the typical saturation voltage of 3.5 V at the collector current Ic=100 A, the turn-off capability of 3/spl times/Ic, and the good pressure contact for the electrical and thermal characteristics in the range from 100 to 800 kg/chip.
2.5 kV 100a /spl mu/ stack
研制了一种2.5 kV 100 A /spl亩/(微)堆型光基。这是第一个证明高电压、大电流和高可靠的平板封装MOS控制器件的可能性的工作。20mm方形芯片与具有四个矩形p基区域的发射极压接,其上没有设置MOS栅极。这种结构的最大优点是双面冷却和无粘结的射极线。/spl mu/堆叠IGBT具有2.5 kV的高阻断电压,集电极电流Ic=100 A时的典型饱和电压为3.5 V,关断能力为3/spl次/Ic,并且在100 ~ 800 kg/芯片范围内具有良好的电性和热特性压接触。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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