Direct growth of carbon nanotubes on a conical tip as a micro-focused x-ray generation source: Effects of various composition ratios of co-sputtered Ni and Co catalysts

Jong-pil Kim, Chang-kyun Park, S. Yun, W. Kim, Young-Kwang Kim, Jin-Seok Park
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Abstract

In this study, we first present the experimental results that regard the direct growth of CNTs on a conical-type tungsten (W) tip and their electron emission properties, in terms of the catalyst materials such as a nickel (Ni) and a cobalt (Co) as well as their composition ratios. Sharpening of W-tips was done by electrochemical etch and their diameters were controlled to range from 5 mum down to sub-mum. The co-sputtering method using Ni and Co targets was used to deposit the catalyst layers with various composition ratios of Ni and Co metals. The composition ratio of the co-sputtered catalysts was evaluated by using an energy dispersive X-ray spectroscopy (EDS, Oxford). CNTs were grown by inductively coupled plasma-chemical vapor deposition (ICP-CVD).
作为微聚焦x射线源的碳纳米管在锥形尖上的直接生长:不同共溅射Ni和Co催化剂组成比例的影响
在本研究中,我们首先从镍(Ni)和钴(Co)等催化剂材料及其组成比的角度,给出了关于CNTs在锥形钨(W)尖端上的直接生长及其电子发射特性的实验结果。利用电化学蚀刻技术对w尖进行锐化,并将其直径控制在5微米到亚微米之间。采用Ni和Co靶材共溅射法制备了Ni和Co金属组成比不同的催化剂层。利用能量色散x射线能谱仪(EDS, Oxford)对共溅射催化剂的组成比例进行了评价。采用电感耦合等离子体化学气相沉积法(ICP-CVD)生长CNTs。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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