Investigation of growth phases of chemical bath deposited CdS thin films

P. Duncan, S. Hinckley, E. Gluszak, N. Dytlewski
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Abstract

Polycrystalline CdS thin films, ranging in thickness from 30 to 200 nm, have been chemically deposited onto glass substrates using an ammonia-cadmium-thiourea reaction solution. Using proton-induced X-ray emission and atomic force microscopy, these film's elemental composition, thickness and microstructure have been examined. Analysis indicates that there is a distinct change from the continuous phase deposition to a particulate phase deposition and that these two different phases produce layers of CdS with different densities. Because of this change in density the point where the particulate CdS phase becomes the dominant deposition process can be identified. A mechanism is proposed to explain this difference in film densities.
化学浴沉积CdS薄膜生长相的研究
利用氨-镉-硫脲反应溶液,在玻璃衬底上化学沉积了厚度为30 ~ 200nm的多晶CdS薄膜。利用质子诱导x射线发射和原子力显微镜对这些薄膜的元素组成、厚度和微观结构进行了研究。分析表明,从连续相沉积到颗粒相沉积有明显的变化,这两种不同的相产生了不同密度的cd层。由于这种密度的变化,可以确定颗粒cd相成为主要沉积过程的点。提出了一种解释膜密度差异的机制。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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