Design and technology co-optimization near single-digit nodes

Abstract

As we approach single-digit nodes, traditional design for manufacturability is augmented through several methodologies and design paradigms such as design-technology co-optimization (DTCO), systematic yield limiters optimization (SYLO), and design retargeting. We discuss triple-patterning and spacer-based multiple patterning and their design implications as these technologies will be necessary to cruise us to single-digit nodes. With the help of DTCO, there seems to be a clear path to sub-10nm with or without extreme ultra-violet lithography.