InP/GaAsSb/InP double heterojunction bipolar transistors

C. Bolognesi, M. Dvorak, S. Watkins
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引用次数: 1

Abstract

InP/GaAsSb/InP double heterojunction bipolar transistors (DHBTs) are some of the fastest bipolar transistors ever fabricated, with current gain cutoff and maximum oscillation frequencies simultaneously exceeding 300 GHz while maintaining breakdown voltages BV/sub CEO/ > 6 V. InP/GaAsSb/InP DHBTs are particularly appealing because excellent device figures of merit are achievable with relatively simple structures involving abrupt junctions and uniform doping levels and compositions: this is a tremendous manufacturability advantage in comparison to GaInAs-based alternatives. This paper highlights some important physical aspects of the use of GaAsSb base layers. In particular, we describe the implications of the staggered band line-up at the E/B and B/C heterojunctions for charge storage in the devices, and show that InP/GaAsSb/InP DHBTs offer inherent advantages with direct implications to applications in high-speed digital circuits.
InP/GaAsSb/InP双异质结双极晶体管
InP/GaAsSb/InP双异质结双极晶体管(dhbt)是目前制造速度最快的双极晶体管之一,其电流增益截止和最大振荡频率同时超过300 GHz,同时保持击穿电压BV/sub / > 6 V。InP/GaAsSb/InP dhbt特别吸引人,因为优异的器件性能可以通过相对简单的结构实现,包括突变结和均匀的掺杂水平和成分:与基于gainas的替代品相比,这是一个巨大的可制造性优势。本文强调了使用GaAsSb基础层的一些重要的物理方面。特别是,我们描述了在E/B和B/C异质结处交错带排列对器件中电荷存储的影响,并表明InP/GaAsSb/InP dhbt具有固有的优势,对高速数字电路的应用具有直接意义。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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