Degraded blocking performance of 4H-SiC rectifiers under high dV/dt conditions

P. Losee, L. Zhu, T. Chow, I. Bhat, R. Gutmann
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引用次数: 5

Abstract

We present our pulsed blocking measurements of co-fabricated 4H-SiC Schottky, junction barrier Schottky (JBS), and pin diodes. Schottky diodes fail at pulsed voltages noticeably lower than their static values, while the pulsed leakage currents of JBS and pin diodes (along with commercial SiC rectifiers) remain below our measurable limits until the reverse voltage approaches the static breakdown. From experimental results and numerical simulations, the premature breakdown of the diodes is attributed to the slow response of deep levels associated with dopant implantation, which can leave high field points such as the edge of contacts unprotected under high dV/dt blocking conditions.
高dV/dt条件下4H-SiC整流器阻塞性能下降
我们提出了我们的脉冲阻挡测量共制4H-SiC肖特基,结势垒肖特基(JBS)和引脚二极管。肖特基二极管在明显低于其静态值的脉冲电压下失效,而JBS和引脚二极管(以及商用SiC整流器)的脉冲泄漏电流仍然低于我们的可测量极限,直到反向电压接近静态击穿。从实验结果和数值模拟来看,二极管的过早击穿归因于与掺杂注入相关的深能级的缓慢响应,在高dV/dt阻塞条件下,这会使高场点(如触点边缘)得不到保护。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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