Design and analysis of memristor-based DRAM cell for low-power application

A. Raman, Deep Shekhar, Ravi Ranjan, Suchitra Kumari
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Abstract

Using conventional memory technologies, for example, static random access memory (RAM) (SRAM), dynamic RAM (DRAM) and flash memory, it is difficult to fulfill the market requirements for higher density and lower power dissipation [1]. Therefore, semiconductor organizations are thinking that it is difficult to supply the expanding market interest for the higher density and lower power nonvolatile memories [2]. The recent invention of memristor device has given hope to semiconductor organizations by offering a less demanding approach to expand the density by utilizing the current fabrication technology [3]. This is conceivable on the grounds that memristor devices just require two terminals to work, which utilize less wafer space, reduce the complexity of circuit interconnections and encourage highdensity integration when used as a part of crossbar structures [4-7]. Besides all these features of memristor, it also has some additional characteristics like low power and non-volatility [8]. But the main limitation of the memristor-based memory cell is its slow write time access [9]. Transmission gate is capable of providing rail-to-rail swing and can easily pass both logic “0” and logic “1” [10]. These advantages help to overcome the problem of slow write time access of memristor. The objective of this chapter is to understand what a memristor is and how can a memristor be modeled for its current-voltage (I-V) characteristics. Further, this chapter deals with the concepts of transmission gates, then using the designed memristor and transmission gates, a DRAM cell was designed. The designed memory cell was simulated using HSPICE tool. The result shows that the memristor-based DRAM cell can replace the conventional memory cell in future to achieve higher density and lower power dissipation.
基于忆阻器的低功耗DRAM单元设计与分析
采用传统的存储技术,如静态随机存取存储器(RAM) (SRAM)、动态随机存取存储器(DRAM)和闪存,很难满足市场对高密度和低功耗的要求[1]。因此,半导体组织认为很难满足高密度低功耗非易失性存储器不断扩大的市场需求[2]。最近发明的忆阻器器件通过利用当前的制造技术提供一种要求较低的方法来扩大密度,给半导体组织带来了希望[3]。这是可以想象的,因为忆阻器器件只需要两个终端就可以工作,这减少了晶圆空间,降低了电路互连的复杂性,并且当用作交叉杆结构的一部分时,可以促进高密度集成[4-7]。除了忆阻器的这些特性外,它还具有低功耗、无易失性等附加特性[8]。但是基于忆阻器的存储单元的主要限制是它的写时间访问慢[9]。传输门能够提供轨对轨的摆动,可以方便地通过逻辑“0”和逻辑“1”[10]。这些优点有助于克服忆阻器的写时间访问慢的问题。本章的目的是了解什么是忆阻器,以及如何根据其电流-电压(I-V)特性对忆阻器进行建模。接着,本章讨论了传输门的概念,然后利用所设计的忆阻器和传输门设计了一个DRAM单元。利用HSPICE工具对所设计的存储单元进行了仿真。结果表明,基于忆阻器的DRAM电池可以在未来取代传统的存储电池,实现更高的密度和更低的功耗。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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