Combined advanced finishing and UV-laser conditioning for producing UV-damage-resistant fused-silica optics

J. Menapace, Bernie Penetrante, Donald Golini, A. Slomba, P. Miller, T. Parham, M. Nichols, J. Peterson
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引用次数: 114

Abstract

Laser-induced damage initiation on fused silica optics can limit the lifetime of the components when used in high power UV laser environments. For example in inertial confinement fusion research applications, the optics can be exposed to temporal laser pulses of about 3 nsec with average fluences of 8 J/cm2 and peak fluences between 12 and 15 J/cm2. During the past year, we have focused on optimizing the damage performance at a wavelength of 355-nm (3(omega) ), 3-nsec pulse length, for optics in this category by examining a variety of finishing technologies with a challenge to improve the laser damage initiation density by at least two orders of magnitude. In this paper, we describe recent advances in improving the 3(omega) damage initiation performance of laboratory-scale zirconium oxide and cerium oxide conventionally finished fused silica optics via application of processes incorporating magnetorheological finishing (MRF), wet chemical etching, and UV laser conditioning. Details of the advanced finishing procedures are described and comparisons are made between the procedures based upon large area 3(omega) damage performance, polishing layer contamination, and optical subsurface damage.
结合先进的精加工和紫外线激光调理,生产抗紫外线损伤的熔融硅光学器件
当在高功率紫外激光环境中使用时,熔融石英光学元件的激光诱导损伤会限制其使用寿命。例如,在惯性约束聚变研究应用中,光学器件可以暴露在约3 nsec的时间激光脉冲下,平均影响为8 J/cm2,峰值影响在12至15 J/cm2之间。在过去的一年里,我们一直致力于优化355 nm (3(omega)), 3-nsec脉冲长度波长下的光学器件的损伤性能,通过研究各种精加工技术,将激光损伤引发密度提高至少两个数量级。在本文中,我们描述了通过应用磁流变精加工(MRF)、湿化学蚀刻和紫外激光调节工艺,在改善实验室规模氧化锆和氧化铈传统熔融石英光学元件的3(omega)损伤引发性能方面的最新进展。描述了高级精加工工艺的细节,并根据大面积3(omega)损伤性能、抛光层污染和光学次表面损伤对工艺进行了比较。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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