L. Chepela, P. Lishchuk, V. Shevchenko, V. Kuryliuk, Elysaveta Polishchuk, A. Kuzmich, P. Teselko, I. Matushko, M. Borovyi
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引用次数: 0
Abstract
This paper is devoted to the study of the fabrication conditions on the structural and thermal properties of multilayered porous silicon structures. The samples were prepared by electro-chemical etching of highly-doped monocrystalline silicon wafer. The etching was conducted with/without mechanical mixing of chemical solution. Morphological and structural properties of synthesized structures were investigated by optical and scanning electron microscopy. The experimental thermal conductivity values versus etching conditions were determined by gas-microphone photoacoustic technique in classic configuration. It was found that the process of electrolyte mixing during sample preparation significantly affects its morphological features, and thus improves thermal transport in the structure.