Preparation of custom gate array silicon wafers to handle specific wafer size in metallization process

F. Ghahghahi, P. Hoss
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Abstract

A wafer reduction sizing and backgrinding process has been developed to downsize larger wafers received from semiconductor vendors to 4-in. diameter and personalize them through Tandem's prototype wafer Fab line. This process avoided the equipment changes necessary to convert to a 5- or 6-in. wafer line, yet made it possible to accept larger wafers from vendors. The wafer sizing and backside grinding processes have been in place at Tandem for two years at a yield of 98%. Process steps are described in detail.<>
定制门阵列硅片的制备,以处理金属化过程中特定的晶圆尺寸
晶圆缩小尺寸和背磨工艺已经被开发出来,可以将半导体供应商提供的更大的晶圆尺寸缩小到4英寸。直径,并通过Tandem的原型晶圆生产线个性化。该工艺避免了转换为5- in或6-in所需的设备更换。晶圆生产线,但使更大的晶圆从供应商接受成为可能。晶圆上浆和背面研磨工艺已经在Tandem公司进行了两年,收率为98%。详细描述了工艺步骤。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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