{"title":"Preparation of custom gate array silicon wafers to handle specific wafer size in metallization process","authors":"F. Ghahghahi, P. Hoss","doi":"10.1109/EMTS.1989.69001","DOIUrl":null,"url":null,"abstract":"A wafer reduction sizing and backgrinding process has been developed to downsize larger wafers received from semiconductor vendors to 4-in. diameter and personalize them through Tandem's prototype wafer Fab line. This process avoided the equipment changes necessary to convert to a 5- or 6-in. wafer line, yet made it possible to accept larger wafers from vendors. The wafer sizing and backside grinding processes have been in place at Tandem for two years at a yield of 98%. Process steps are described in detail.<<ETX>>","PeriodicalId":432803,"journal":{"name":"Proceedings. Seventh IEEE/CHMT International Electronic Manufacturing Technology Symposium,","volume":"4 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Proceedings. Seventh IEEE/CHMT International Electronic Manufacturing Technology Symposium,","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/EMTS.1989.69001","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0
Abstract
A wafer reduction sizing and backgrinding process has been developed to downsize larger wafers received from semiconductor vendors to 4-in. diameter and personalize them through Tandem's prototype wafer Fab line. This process avoided the equipment changes necessary to convert to a 5- or 6-in. wafer line, yet made it possible to accept larger wafers from vendors. The wafer sizing and backside grinding processes have been in place at Tandem for two years at a yield of 98%. Process steps are described in detail.<>